Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GSTA1 | P08263 | 2/20 | 0.67 |
| ▸ | LIG1 | P18858 | 1/20 | 0.62 |
| ▸ | HPGD | P15428 | 5/20 | 0.61 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.61 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.61 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.61 |
| ▸ | LMNA | P02545 | 2/20 | 0.61 |
| ▸ | PGR | P06401 | 1/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.61 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.61 |
| ▸ | AR | P10275 | 1/20 | 0.61 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.61 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.61 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.61 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.61 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.61 |
| ▸ | SIRT1 | Q96EB6 | 2/20 | 0.58 |
| ▸ | CA12 | O43570 | 3/20 | 0.57 |
| ▸ | CA1 | P00915 | 3/20 | 0.57 |
| ▸ | CA2 | P00918 | 3/20 | 0.57 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7551903 | 0.94 | CA12 (0.59) | GSTA1LIG1HPGDCYP1A2ALOX15 | |
| SCHEMBL3905124 | 0.89 | CA12 (0.70) | GSTA1HPGDCYP1A2ALOX15CYP2C19 | |
| SCHEMBL29517975 | 0.88 | MEN1 (0.69) | GSTA1LIG1HPGDCYP1A2ALOX15 | |
| SCHEMBL93207 | 0.88 | MEN1 (0.69) | GSTA1LIG1HPGDCYP1A2ALOX15 | |
| SCHEMBL11691699 | 0.86 | CA12 (0.68) | GSTA1HPGDCYP1A2ALOX15CYP2C19 | |
| SCHEMBL8861157 | 0.86 | CA12 (0.52) | GSTA1LIG1HPGDCYP1A2ALOX15 | |
| SCHEMBL6381759 | 0.85 | CES2 (0.61) | GSTA1HPGDCYP1A2ALOX15CYP2C19 | |
| SCHEMBL13589361 | 0.85 | GSTA1 (0.83) | GSTA1LIG1HPGDCYP1A2ALOX15 | |
| SCHEMBL22939382 | 0.85 | CA12 (0.60) | GSTA1LIG1HPGDCYP1A2ALOX15 | |
| SCHEMBL11843932 | 0.85 | RECQL (0.51) | GSTA1LIG1HPGDCYP1A2ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025055600-A1 | SURFACE TREATMENT METHOD FOR METAL OR ALLOY, AND METAL OR ALLOY PRODUCT | 福耀玻璃工业集团股份有限公司 | 2025-03-20 | — | — | WO | claimed |
| WO-2025055600-A1 | SURFACE TREATMENT METHOD FOR METAL OR ALLOY, AND METAL OR ALLOY PRODUCT | 福耀玻璃工业集团股份有限公司 | 2025-03-20 | — | — | WO | disclosed |
| US-10719015-B2 | Positive resist film laminate and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-21 | — | — | US | disclosed |
| EP-3392708-B1 | POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-03-18 | — | — | EP | disclosed |
| EP-3392708-A1 | POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-10-24 | — | — | EP | disclosed |
| US-6383708-B1 | ALKALI SOLUBLE NOVOLAK RESIN AN ESTER OF HYDROXYL GROUPS CONTAINING QUINONE DIAZIDE SULFONIC ACID AND SOLVENTS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-07 | — | — | US | disclosed |
| EP-0557991-B1 | Positive type resist composition | SUMITOMO CHEMICAL CO (JP) | 2000-01-26 | — | — | EP | disclosed |
| EP-0550009-B1 | Positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1999-06-02 | — | — | EP | disclosed |
| EP-0461654-B1 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1999-02-17 | — | — | EP | disclosed |
| US-5849457-A | Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and γ- | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-12-15 | — | — | US | disclosed |
| EP-0550009-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-07-07 | — | — | EP | disclosed |
| EP-0528401-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-24 | — | — | EP | disclosed |
| US-5188920-A | Photosensitivity, resolution, heat resistance, adhesiveness | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-23 | — | — | US | disclosed |
| EP-0525185-A1 | POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1993-02-03 | — | — | EP | disclosed |
| EP-0510671-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510670-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| US-5130225-A | And alkali soluble resin, a quinone oxazide compound and a hydroxyl containing compound, film thickness retention | SUMITOMO CHEMICAL CO. LTD. (JP) | 1992-07-14 | — | — | US | disclosed |
| EP-0461388-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0461654-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0460416-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-11 | — | — | EP | disclosed |