SCHEMBL7714293

SCHEMBL7714293

Cc1cccc(-c2ncncn2)c1N

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CD44 P16070 1/20 0.43
CYP3A4 P08684 5/20 0.38
CYP1A2 P05177 4/20 0.38
CYP2D6 P10635 4/20 0.38
NOS3 P29474 2/20 0.36
NOS2 P35228 2/20 0.36
NOS1 P29475 1/20 0.36
EGFR P00533 1/20 0.35
LMNA P02545 1/20 0.35
TSHR P16473 3/20 0.35
CYP2C19 P33261 3/20 0.35
PIK3CD O00329 3/20 0.35
PIK3CA P42336 2/20 0.35
PIK3CB P42338 2/20 0.35
PIK3CG P48736 2/20 0.35
PRKDC P78527 2/20 0.35
HSP90AA1 P07900 2/20 0.34
POLB P06746 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1317752 0.80 ALDH1A1 (0.37) CD44CYP3A4CYP1A2CYP2D6LMNA
SCHEMBL1445775 0.80 CYP1A2 (0.40) CYP3A4CYP1A2CYP2D6TSHRCYP2C19
SCHEMBL9444918 0.79 CYP1A2 (0.50) CYP3A4CYP1A2CYP2D6TSHRCYP2C19
SCHEMBL12452253 0.77 NOS3 (0.38) CD44CYP3A4CYP1A2CYP2D6NOS3
SCHEMBL29118552 0.77 ALDH1A1 (0.48) CYP3A4CYP1A2CYP2D6TSHRCYP2C19
SCHEMBL15094834 0.77 SMN1; SMN2 (0.40) CYP1A2EGFRLMNATSHRPIK3CD
SCHEMBL31158157 0.77 CYP3A4 (0.48) CD44CYP3A4CYP1A2CYP2D6TSHR
SCHEMBL30839806 0.76 CD44 (0.62) CD44CYP3A4CYP1A2NOS3NOS2
SCHEMBL3790203 0.76 CD44 (0.62) CD44CYP3A4CYP1A2NOS3NOS2
Hydrochloric Acid SCHEMBL11680714 0.74 CD44 (0.59) CD44CYP3A4CYP1A2NOS3NOS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6376153-B2 COMPRISING AN ADDITION POLYMERIZABLE ETHENICALLY UNSATURATED COMPOUND, PHOTOINITIATOR, AN OXIDE OF AT LEAST ONE OF COPPER, IRON, MANGANESE, CHROMIUM, COBALT, NICKEL, AND ALUMINUM, HALOGEN-FREE; STORAGE STABILITY TOKYO OHKA KOGYO CO., LTD. (JP) 2002-04-23 US disclosed
US-6265116-B1 ADDITION PHOTOPOLYMERIZATION OF ETHYLENICALLY UNSATURATED COMPOUND USING PHOTOINITIATOR AND METAL OXIDE; HALOGEN-FREE; DRYING, ACTINICALLY RADIATING, DEVELOPING TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-24 US disclosed