⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4073190 | 0.92 | — | — | |
| SCHEMBL6287683 | 0.77 | — | — | |
| SCHEMBL3482170 | 0.77 | — | — | |
| SCHEMBL6287688 | 0.77 | — | — | |
| SCHEMBL2119929 | 0.75 | OPRM1 (0.44) | — | |
| SCHEMBL17100561 | 0.75 | OPRM1 (0.44) | — | |
| SCHEMBL1614341 | 0.75 | OPRM1 (0.44) | — | |
| SCHEMBL661577 | 0.75 | OPRM1 (0.44) | — | |
| SCHEMBL2120546 | 0.75 | OPRM1 (0.44) | — | |
| SCHEMBL2018010 | 0.75 | OPRM1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8461263-B2 | End-modified diene copolymer having good compatibility with reinforcing silica and preparation method thereof | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-06-11 | — | — | US | claimed |
| US-20130090427-A1 | END-MODIFIED DIENE COPOLYMER HAVING GOOD COMPATIBILITY WITH REINFORCING SILICA AND PREPARATION METHOD THEREOF | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-04-11 | — | — | US | claimed |
| US-8461263-B2 | End-modified diene copolymer having good compatibility with reinforcing silica and preparation method thereof | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-06-11 | — | — | US | disclosed |
| US-20130090427-A1 | END-MODIFIED DIENE COPOLYMER HAVING GOOD COMPATIBILITY WITH REINFORCING SILICA AND PREPARATION METHOD THEREOF | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-04-11 | — | — | US | disclosed |
| US-20020024011-A1 | Method for correcting opaque defects in reticles for charged-particle-beam microlithography, and reticles produced using same | NIKON CORPORATION | 2002-02-28 | — | — | US | disclosed |