Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | DNM1 | Q05193 | 7/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17105915 | 1.00 | TSHR (0.44) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL27630454 | 1.00 | TSHR (0.44) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL17105916 | 1.00 | TSHR (0.44) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL869304 | 1.00 | TSHR (0.44) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL804367 | 0.97 | TSHR (0.42) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL173430 | 0.97 | TSHR (0.39) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL15497547 | 0.95 | TSHR (0.40) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL6274075 | 0.94 | TSHR (0.37) | TSHRTHRBLMNASLC22A1 | |
| SCHEMBL15047948 | 0.90 | TSHR (0.40) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL1593310 | 0.90 | TSHR (0.40) | TSHRTHRBDNM1ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106343-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| US-20210122925-A1 | METHODS OF USING SURFACE TREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-04-29 | — | — | US | claimed |
| CN-112513192-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2021-03-16 | — | — | CN | claimed |
| EP-3735325-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2020-11-11 | — | — | EP | claimed |
| CN-111565859-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2020-08-21 | — | — | CN | claimed |
| US-20200035494-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2020-01-30 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| EP-1224694-A1 | SOLVENTS FOR PROCESSING SILSESQUIOXANE AND SILOXANE RESINS | AlliedSignal Inc. (US) | 2002-07-24 | — | — | EP | claimed |
| EP-0935632-B1 | STABLE SOLUTIONS OF A SILSESQUIOXANE OR SILOXANE RESIN AND A SILICONE SOLVENT | ALLIED SIGNAL INC (US) | 2001-12-12 | — | — | EP | claimed |
| US-6287477-B1 | REMOVAL OF EDGE BEAD FROM SUBSTRATE | HONEYWELL INTERNATIONAL INC. | 2001-09-11 | — | — | US | claimed |
| WO-2001029887-A1 | SOLVENTS FOR PROCESSING SILSESQUIOXANE AND SILOXANE RESINS | ALLIEDSIGNAL INC. (US) | 2001-04-26 | — | — | WO | claimed |
| US-6020410-A | BLENDS; PROTECTIVE COATINGS | ALLIEDSIGNAL INC. (US) | 2000-02-01 | — | — | US | claimed |