Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | CTSK | P43235 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30690798 | 0.83 | TSHR (0.39) | TSHRALDH1A1 | |
| SCHEMBL438463 | 0.81 | TSHR (0.45) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL3802183 | 0.81 | TSHR (0.45) | TSHRALDH1A1THRBTDP1 | |
| Ethane SCHEMBL2403295 | 0.79 | TSHR (0.43) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL6924021 | 0.79 | TSHR (0.43) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL17708345 | 0.78 | TSHR (0.46) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL25431381 | 0.77 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL1440496 | 0.77 | TSHR (0.42) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL6924017 | 0.77 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL6571060 | 0.77 | ALDH1A1 (0.50) | TSHRALDH1A1THRBTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-112980543-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-19 | — | — | CN | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| EP-3839018-B1 | HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME | INFINEUM INT LTD (GB) | 2023-10-18 | — | — | EP | disclosed |
| EP-3839019-B1 | HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME | INFINEUM INT LTD (GB) | 2023-08-02 | — | — | EP | disclosed |
| US-11697754-B2 | Thermal conductive layer, photosensitive layer, photosensitive composition, manufacturing method for thermal conductive layer, and laminate and semiconductor device | FUJIFILM CORPORATION (JP) | 2023-07-11 | — | — | US | disclosed |
| US-11685874-B2 | High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same | INFINEUM INTERNATIONAL LIMITED (GB) | 2023-06-27 | — | — | US | disclosed |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161249-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20150118616-A1 | METHOD FOR FORMING RESIST PATTERN AND RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-30 | — | — | US | disclosed |
| US-9012128-B2 | Photoresist and coated substrate comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-04-21 | — | — | US | disclosed |
| US-20140363772-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363772-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8722825-B2 | Surface active additive and photoresist composition comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-05-13 | — | — | US | disclosed |
| US-20140065540-A1 | PHOTORESIST AND COATED SUBSTRATE COMPRISING SAME | Rohm and Haas Electronic Materials (US) | 2014-03-06 | — | — | US | disclosed |
| US-20130137035-A1 | SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME | DOW GLOBAL TECHNOLOGIES LLC (US) | 2013-05-30 | — | — | US | disclosed |
| US-6379861-B1 | POLY(METH)ACRYLATE ESTER WITH TERTIARY OR QUATERNARY CARBON AND PHOTOACTIVE COMPOUND; HIGH RESOLUTION RELIEF IMAGES; CHEMICALLY-AMPLIFIED POSITIVES | SHIPLEY COMPANY, L.L.C. | 2002-04-30 | — | — | US | disclosed |
| US-6136501-A | PHOTORESIST COMPOSITION COMPRISING PHOTOACTIVE COMPONENT AND POLYMER THAT COMPRISES ESTER GROUPS | SHIPLEY COMPANY, L.L.C. (US) | 2000-10-24 | — | — | US | disclosed |
| EP-1008913-A1 | Photoresist compositions comprising itaconic anhydride polymers | Shipley Company LLC (US) | 2000-06-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | TSHR 1473/4885ALDH1A1 2433/4885THRB 3506/4885 |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | RER1, TERB1, TRRAP | TSHR 1470/4885ALDH1A1 2457/4885THRB 3553/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.