Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.34 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.34 |
| ▸ | CASP3 | P42574 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.34 |
| ▸ | RELA | Q04206 | 1/20 | 0.34 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.34 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.34 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.34 |
| ▸ | KIF11 | P52732 | 3/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11015531 | 0.92 | ALDH1A1 (0.36) | ALDH1A1NPC1PLA2G1BNFKB1CASP3 | |
| SCHEMBL19820943 | 0.89 | ALDH1A1 (0.35) | ALDH1A1NPC1PLA2G1BNFKB1CASP3 | |
| SCHEMBL6860759 | 0.84 | ALDH1A1 (0.37) | ALDH1A1KIF11 | |
| SCHEMBL9637292 | 0.80 | ELANE (0.31) | — | |
| SCHEMBL11069765 | 0.79 | CYP1A2 (0.33) | — | |
| SCHEMBL9160477 | 0.78 | MAOA (0.39) | ALDH1A1NPC1RAB9AHPGDALOX15 | |
| SCHEMBL10476775 | 0.78 | MAOA (0.39) | ALDH1A1NPC1RAB9AHPGDALOX15 | |
| SCHEMBL36333 | 0.78 | MAOA (0.39) | ALDH1A1NPC1RAB9AHPGDALOX15 | |
| SCHEMBL10801585 | 0.78 | KDM4E (0.30) | ALDH1A1NPC1RAB9AHPGD | |
| SCHEMBL15411118 | 0.78 | ALDH1A1 (0.34) | ALDH1A1RAB9AHPGDTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2820073-B1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | ELECTRONICS FOR IMAGING INC (US) | 2018-09-05 | — | — | EP | claimed |
| US-9260616-B2 | Gloss-controllable, radiation-curable inkjet ink | ELECTRONICS FOR IMAGING, INC. (US) | 2016-02-16 | — | — | US | claimed |
| EP-2820073-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | Electronics for Imaging, Inc. (US) | 2015-01-07 | — | — | EP | claimed |
| WO-2013130618-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | ELECTRONICS FOR IMAGING, INC. (US) | 2013-09-06 | — | — | WO | claimed |
| US-20130222499-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | GLAS USA LLC [SUCCESSOR COLLATERAL AGENT] | 2013-08-29 | — | — | US | claimed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | claimed |
| CN-118215511-A | GELMA polymer compositions and uses thereof | 盖尔梅迪克斯公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-118112889-A | Photosensitive resist composition and dry film resist | 杭州福斯特电子材料有限公司 | 2024-05-31 | — | — | CN | disclosed |
| EP-3464491-B1 | LOW ODOR RADIATION CURABLE INK COMPOSITIONS | ELECTRONICS FOR IMAGING INC (US) | 2024-05-01 | — | — | EP | disclosed |
| CN-111856881-B | Photosensitive resin composition, dry film resist and corresponding element | 杭州福斯特电子材料有限公司 | 2024-03-26 | — | — | CN | disclosed |
| EP-3415555-B1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | ELECTRONICS FOR IMAGING INC (US) | 2022-03-09 | — | — | EP | disclosed |
| CN-106933032-B | Black photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2020-12-11 | — | — | CN | disclosed |
| US-20200071551-A1 | LOW ODOR RADIATION CURABLE INK COMPOSITIONS | ELECTRONICS FOR IMAGING, INC. | 2020-03-05 | — | — | US | disclosed |
| US-20130222499-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | GLAS USA LLC [SUCCESSOR COLLATERAL AGENT] | 2013-08-29 | — | — | US | disclosed |
| US-6384099-B1 | APPLYING DENTAL MATERIAL INCLUDING MONOMERS AND INITIATOR SENSITIVE TO LIGHT OF PARTICULAR WAVELENGTH TO DENTAL SURFACE, EXPOSING MATERIAL TO LIGHT AT FIRST POWER LEVEL TO INITIATE POLYMERIZATION, EXPOSING TO LIGHT AT SECOND POWER LEVEL | LASER MED. INC. | 2002-05-07 | — | — | US | disclosed |
| US-6282013-B1 | System for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation | LASERMED, INC. | 2001-08-28 | — | — | US | disclosed |
| US-6008264-A | APPLYING A DENTAL MATERIAL WITH LIGHT SENSITIVE INITIATOR TO A DENTAL SURFACE, EXPOSING TO LIGHT SOURCE AT FIRST POWER LEVEL TO INITIATE POLYMERIZATION, SIMULTANEOUSLY DECREASING LEVEL OF LIGHT, MAINTAINING UNTIL MATERIAL IS POLYMERIZED | LASER MED, INC. (US) | 1999-12-28 | — | — | US | disclosed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| US-4935330-A | Photopolymerizable mixture, photosensitive recording element containing this mixture, and the production of lithographic printing plate using this photosensitive recording element | BASF AKTIENGESELLSCHAFT (DE) | 1990-06-19 | — | — | US | disclosed |
| US-4450279-A | PHOTOPOLYMERIZATION SENSITIZERS FOR UNSATURATED MONOMERS; RAPID HARDENING; STORAGE STABILITY | NIPPON, KAYAKU, KABUSHIKI, KAISHA (JP) | 1984-05-22 | — | — | US | disclosed |