SCHEMBL7738524

SCHEMBL7738524

C=C(C(=O)Oc1ccc2ccccc2c1)C(C)(C)C

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.50
MEN1 O00255 3/20 0.50
MAPT P10636 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.45
ALDH1A1 P00352 1/20 0.45
HSD17B10 Q99714 1/20 0.45
RAB9A P51151 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2A6 P11509 1/20 0.43
PTPN7 P35236 1/20 0.42
MMP1 P03956 2/20 0.42
MMP12 P39900 1/20 0.42
KDM4E B2RXH2 1/20 0.42
PPARG P37231 2/20 0.42
HTT P42858 1/20 0.42
NCOA2 Q15596 1/20 0.42
NCOA1 Q15788 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
NR2E3 Q9Y5X4 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36603 0.81 ELANE (0.58) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL29801955 0.81 ELANE (0.58) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL31476932 0.81 ELANE (0.58) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL9746229 0.81 ELANE (0.49) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL21881869 0.80 KMT2A (0.66) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL30339521 0.80 ELANE (0.58) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL12618375 0.80 ELANE (0.58) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL18499918 0.78 KMT2A (0.54) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL31026643 0.78 KMT2A (0.54) KMT2AMEN1MAPTTDP1L3MBTL1
SCHEMBL2907053 0.77 KMT2A (0.50) KMT2AMEN1MAPTTDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6410748-B1 Alicycli c group-containing monomer KABUSHIKI KAISHA TOSHIBA (JP) 2002-06-25 US disclosed
US-6291129-B1 LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS KABUSHIKI KAISHA TOSHIBA (JP) 2001-09-18 US disclosed
US-6280897-B1 GENERATION OF ACID WITH ACTINIC RADIATION KABUSHIKI KAISHA TOSHIBA (JP) 2001-08-28 US disclosed
US-6060207-A LOW IN ABSORPTION OF A LIGHT SOURCE OF SHORT WAVELENGTH AND EXCELLENT IN DRY ETCH RESISTANCE; COMPRISES A COMPOUND HAVING A TERPENOID SKELETON KABUSHIKI KAISHA TOSHIBA (JP) 2000-05-09 US disclosed
US-5932391-A CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT KABUSHIKI KAISHA TOSHIBA (JP) 1999-08-03 US disclosed
US-5863699-A FORMS A PATTERN THROUGH LIGHT-EXPOSURE WITH EITHER ARGON FLUORIDE OR FLUORINE EXCIMER LASERS, COMPRISES A COMPOUND HAVING EITHER AN ACID-DECOMPOSABLE OR ACID-CROSSLINKABLE GROUP KABUSHIKI KAISHA TOSHIBA (JP) 1999-01-26 US disclosed