Catechol

Catechol

SCHEMBL7740920

NCCOCCO.NO.Oc1ccccc1O

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 2/20 0.41
KDM4E B2RXH2 3/20 0.40
ALDH1A1 P00352 3/20 0.40
MAPK1 P28482 3/20 0.40
RECQL P46063 2/20 0.40
LMNA P02545 2/20 0.40
MAPT P10636 2/20 0.40
CYP3A4 P08684 2/20 0.40
HPGD P15428 2/20 0.40
ALOX15 P16050 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
TSHR P16473 2/20 0.40
RAB9A P51151 2/20 0.40
NPC1 O15118 1/20 0.40
CA12 O43570 1/20 0.40
GMNN O75496 1/20 0.40
EGFR P00533 1/20 0.40
CA2 P00918 1/20 0.40
FYN P06241 1/20 0.40
POLB P06746 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Catechol SCHEMBL8563184 0.88 TAAR1 (0.35) TAAR1KDM4EALDH1A1MAPK1RECQL
Catechol SCHEMBL3905550 0.87 ALDH1A1 (0.53) KDM4EALDH1A1MAPK1RECQLLMNA
Catechol SCHEMBL6689005 0.87 ALDH1A1 (0.53) KDM4EALDH1A1MAPK1RECQLLMNA
Catechol SCHEMBL3985412 0.78 ALDH1A1 (0.53) TAAR1KDM4EALDH1A1MAPK1RECQL
Hydroxyamine SCHEMBL23217679 0.78 MEN1 (0.65) ALDH1A1MAPK1MAPTTSHRMEN1
Catechol SCHEMBL2279087 0.78 ALDH1A1 (0.59) TAAR1KDM4EALDH1A1MAPK1RECQL
Catechol SCHEMBL60031 0.78 MAPT (0.67) TAAR1KDM4EALDH1A1MAPK1RECQL
SCHEMBL18700 0.78
SCHEMBL503911 0.78 TSHR (0.67) ALDH1A1MAPK1MAPTTSHRMEN1
Di(Hydroxyethyl)Ether SCHEMBL10631967 0.77 ALDH1A1 (0.50) KDM4EALDH1A1MAPK1RECQLLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6423646-B1 Method for removing etch-induced polymer film and damaged silicon layer from a silicon surface VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION (TW) 2002-07-23 US disclosed