Perchlorate

Perchlorate

SCHEMBL7741241

CCCCOc1ccc(-c2ccc(-c3ccccc3)[o+]c2-c2ccccc2)cc1.[O-][Cl+3]([O-])([O-])[O-]

nearest known ligand 0.49

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.49
CYP2D6 P10635 3/20 0.43
CYP3A4 P08684 2/20 0.43
CYP19A1 P11511 2/20 0.43
CYP2C9 P11712 2/20 0.43
CYP2C19 P33261 2/20 0.43
CYP1A2 P05177 1/20 0.43
LSS P48449 1/20 0.41
ATP4A P20648 6/20 0.40
ATP4B P51164 6/20 0.40
CHRNB2 P17787 1/20 0.40
CHRNB4 P30926 1/20 0.40
CHRNA3 P32297 1/20 0.40
CHRNA7 P36544 1/20 0.40
CHRNA4 P43681 1/20 0.40
PTPN1 P18031 1/20 0.39
RAB9A P51151 2/20 0.39
KDM4E B2RXH2 1/20 0.39
NPC1 O15118 1/20 0.39
ALDH1A1 P00352 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7745719 0.95 LTA4H (0.54) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9
Perchlorate SCHEMBL7741224 0.82 ABL1 (0.50) LTA4HRAB9AKDM4ENPC1ALDH1A1
Perchlorate SCHEMBL9509462 0.81 LTA4H (0.51) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9
SCHEMBL27670043 0.80 LTA4H (0.63) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9
Perchlorate SCHEMBL11047037 0.79 LTA4H (0.54) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9
Hydrogen Sulfide SCHEMBL27725312 0.78 LTA4H (0.61) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9
SCHEMBL31550426 0.77 LTA4H (0.66) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9
Fluoride SCHEMBL27907087 0.77 LTA4H (0.59) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9
Perchlorate SCHEMBL11761902 0.76 LTA4H (0.50) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9
SCHEMBL27483624 0.75 LTA4H (0.64) LTA4HCYP2D6CYP3A4CYP19A1CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180320-B1 Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2001-01-30 US disclosed