SCHEMBL7741363

SCHEMBL7741363

CCC(=O)OCC(C)OC(C)=O

nearest known ligand 0.45

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.45
CHRM2 P08172 1/20 0.45
CHRM4 P08173 1/20 0.45
CHRM1 P11229 1/20 0.45
TBXA2R P21731 1/20 0.45
MAPT P10636 2/20 0.44
GALR3 O60755 1/20 0.44
BLM P54132 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
PRKCA P17252 3/20 0.40
TDP1 Q9NUW8 1/20 0.38
NAAA Q02083 1/20 0.36
ALDH1A1 P00352 2/20 0.36
LMNA P02545 2/20 0.36
HSD17B10 Q99714 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28118719 0.89 TSHR (0.38) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL181935 0.87 NAAA (0.39) TSHRMAPTBLMPRKCANAAA
Ethyl Propionate SCHEMBL28837177 0.83 TSHR (0.39) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL181610 0.83 TDP1 (0.42) TSHRCHRM2CHRM4CHRM1TBXA2R
Propylene Glycol Diacetate SCHEMBL49091 0.82 TDP1 (0.54) TSHRCHRM2CHRM4CHRM1TBXA2R
Propylene Glycol Diacetate SCHEMBL8503200 0.82 TDP1 (0.54) TSHRCHRM2CHRM4CHRM1TBXA2R
Ethylene Glycol SCHEMBL1490293 0.82 PRKCA (0.36) MAPTBLMPRKCANAAAALDH1A1
SCHEMBL26267516 0.82 NAAA (0.35) TSHRMAPTBLMSMN1; SMN2PRKCA
SCHEMBL4067170 0.81 TSHR (0.53) TSHRMAPTBLMPRKCANAAA
SCHEMBL11782982 0.81 PRKCA (0.53) MAPTSMN1; SMN2PRKCATDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6415614-B1 CONTROLLING VAPOR PRESSURE OF MIXTURE VISTEON GLOBAL TECHNOLOGIES, INC. 2002-07-09 US claimed
CN-119843505-A Ink jet printing method and ink set 精工爱普生株式会社 2025-04-18 CN disclosed
US-20230299355-A1 ELECTROLYTIC SOLUTION FOR SECONDARY BATTERY, AND SECONDARY BATTERY MURATA MANUFACTURING CO., LTD. (JP) 2023-09-21 US disclosed
US-20230198021-A1 ELECTROLYTIC SOLUTION FOR SECONDARY BATTERY, AND SECONDARY BATTERY MURATA MANUFACTURING CO., LTD. (JP) 2023-06-22 US disclosed
CN-110949030-B Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2023-05-02 CN disclosed
CN-115595017-A Inkjet ink composition and recording method 精工爱普生株式会社(JP) 2023-01-13 CN disclosed
CN-115584165-A Inkjet ink composition and recording method 精工爱普生株式会社 2023-01-10 CN disclosed
CN-113334928-B Recording method and ink jet recording apparatus 精工爱普生株式会社 2022-12-13 CN disclosed
CN-115124885-A White inkjet ink composition and inkjet recording method 精工爱普生株式会社 2022-09-30 CN disclosed
CN-112238692-B Recording method and recording apparatus 精工爱普生株式会社 2022-08-19 CN disclosed
CN-110871624-B Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2022-07-12 CN disclosed
CN-113370668-A Ink jet textile printing and recording apparatus and ink jet recording method 精工爱普生株式会社 2021-09-10 CN disclosed
CN-113334928-A Recording method and ink jet recording apparatus 精工爱普生株式会社 2021-09-03 CN disclosed
CN-112238692-A Recording method and recording apparatus 精工爱普生株式会社 2021-01-19 CN disclosed
CN-110949030-A Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2020-04-03 CN disclosed
CN-110871624-A Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2020-03-10 CN disclosed
US-3933518-A CHLORINATED ALIPHATIC HYDROCARBONS, ALKYLENE GLYCOL ALKANOATE THE DOW CHEMICAL COMPANY (US) 1976-01-20 US disclosed
US-3933517-A Compositions for reflowing organic surfaces THE DOW CHEMICAL COMPANY (US) 1976-01-20 US disclosed