Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.59 |
| ▸ | CDC25B | P30305 | 2/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.53 |
| ▸ | MAPT | P10636 | 4/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.51 |
| ▸ | CDC25A | P30304 | 1/20 | 0.51 |
| ▸ | CDC25C | P30307 | 1/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | USP2 | O75604 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | MAPK10 | P53779 | 1/20 | 0.48 |
| ▸ | PTK2B | Q14289 | 1/20 | 0.48 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalic Acid SCHEMBL29064574 | 0.95 | TSHR (0.62) | TSHRCDC25BHSD17B10MAPTALDH1A1 | |
| SCHEMBL3681837 | 0.93 | TSHR (0.68) | TSHRCDC25BHSD17B10MAPTALDH1A1 | |
| SCHEMBL18526159 | 0.88 | TSHR (0.66) | TSHRCDC25BHSD17B10MAPTALDH1A1 | |
| SCHEMBL28289328 | 0.87 | ALDH1A1 (0.62) | TSHRCDC25BHSD17B10MAPTALDH1A1 | |
| SCHEMBL21845577 | 0.85 | TSHR (0.61) | TSHRCDC25BHSD17B10MAPTALDH1A1 | |
| SCHEMBL27412533 | 0.84 | TSHR (0.64) | TSHRHSD17B10MAPTALDH1A1KDM4E | |
| SCHEMBL9794664 | 0.84 | TSHR (0.59) | TSHRHSD17B10MAPTALDH1A1CYP1A2 | |
| SCHEMBL954473 | 0.83 | TSHR (0.59) | TSHRCDC25BHSD17B10MAPTALDH1A1 | |
| SCHEMBL27483119 | 0.83 | HSD17B10 (0.58) | TSHRCDC25BHSD17B10MAPTALDH1A1 | |
| SCHEMBL27552378 | 0.83 | HSD17B10 (0.53) | TSHRCDC25BHSD17B10MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1093153-C | Crystalline polymer blends containing low molecular weight poly (phenylene ether) resin | GEN ELECTRIC (US) | 2002-10-23 | — | — | CN | claimed |
| CN-1174214-A | Crystalline polymer blends containing low molecular weight poly (phenylene ether) resin | GEN ELECTRIC (US) | 1998-02-25 | — | — | CN | claimed |
| CN-1047318-A | POLYMERIC FILM | ICI PLC (GB) | 1990-11-28 | — | — | CN | claimed |
| CN-109563009-A | Alkene oligomerization process | 公共型股份公司希布尔控股 | 2019-04-02 | — | — | CN | disclosed |
| CN-105121565-A | Photocurable coating composition, coating film using same and polarizing plate | DONGWOO FINE CHEM CO LTD | 2015-12-02 | — | — | CN | disclosed |
| CN-103443087-B | Polymerizable compound, polymerizable liquid crystal composition, polymeric compound, and film | FUJIFILM CORP | 2015-04-08 | — | — | CN | disclosed |
| CN-103781755-A | Polymerizable liquid crystal compound, polymerizable composition, polymer material, and film | FUJI PHOTO FILM CO LTD | 2014-05-07 | — | — | CN | disclosed |
| CN-103443087-A | Polymerizable compound, polymerizable liquid crystal composition, polymeric compound, and film | FUJIFILM CORP | 2013-12-11 | — | — | CN | disclosed |
| CN-100334174-C | Composition for forming matte layer, release sheet, and synthetic leather | DAINIPPON PRINTING CO LTD (JP) | 2007-08-29 | — | — | CN | disclosed |
| CN-1485387-A | Composition for forming matte layer, release sheet, and synthetic leather | ���ձ�ӡˢ��ʽ���� | 2004-03-31 | — | — | CN | disclosed |
| CN-1098124-C | Oxidation catalyst system and process for oxidation with the same | DAICEL CHEM (JP) | 2003-01-08 | — | — | CN | disclosed |
| US-6238842-B1 | SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-29 | — | — | US | disclosed |
| CN-1185757-A | Oxidation catalyst system and oxidation process using the same | DAICEL CHEM (JP) | 1998-06-24 | — | — | CN | disclosed |
| CN-1035432-C | Catalyst and method for purifying a crude terephthalic acid, isophthalic acid or naphthalene dicarboxylic acid | AMOCO CORP (US) | 1997-07-16 | — | — | CN | disclosed |
| CN-1151992-A | (Co) polymers based on vinyl units and use thereof in electroluminescent arrangements | BAYER AG (DE) | 1997-06-18 | — | — | CN | disclosed |
| CN-1032015-C | Styrene polymer composition | IDEMITSU KOSAN CO (JP) | 1996-06-12 | — | — | CN | disclosed |
| CN-1050886-A | STYRENE POLYMER COMPOSITION | IDEMITSU KOSAN CO (JP) | 1991-04-24 | — | — | CN | disclosed |
| CN-1047318-A | POLYMERIC FILM | ICI PLC (GB) | 1990-11-28 | — | — | CN | disclosed |