SCHEMBL7742363

SCHEMBL7742363

FCC(F)(F)c1ccccn1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
AHR P35869 1/20 0.39
KDM4E B2RXH2 1/20 0.37
LMNA P02545 1/20 0.37
CYP1A2 P05177 1/20 0.37
POLB P06746 1/20 0.37
CCR1 P32246 1/20 0.37
CCR5 P51681 1/20 0.37
CCR8 P51685 1/20 0.37
METAP1 P53582 1/20 0.37
BLM P54132 1/20 0.37
HIF1A Q16665 1/20 0.37
DOHH Q9BU89 1/20 0.37
P4HTM Q9NXG6 1/20 0.37
CHRM2 P08172 1/20 0.36
MAPT P10636 1/20 0.35
GRIN2B Q13224 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
MEN1 O00255 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2466203 0.81 SMN1; SMN2 (0.48) SMN1; SMN2L3MBTL1AHRKDM4ELMNA
SCHEMBL5854793 0.81 SMN1; SMN2 (0.48) SMN1; SMN2L3MBTL1AHRKDM4ELMNA
SCHEMBL29896219 0.81 SMN1; SMN2 (0.54) SMN1; SMN2L3MBTL1AHRKDM4ELMNA
SCHEMBL16234253 0.81 SMN1; SMN2 (0.48) SMN1; SMN2L3MBTL1AHRKDM4ELMNA
SCHEMBL1872051 0.81 SMN1; SMN2 (0.54) SMN1; SMN2L3MBTL1AHRKDM4ELMNA
SCHEMBL221865 0.81 SMN1; SMN2 (0.48) SMN1; SMN2L3MBTL1AHRKDM4ELMNA
SCHEMBL17189971 0.78 SMN1; SMN2 (0.45) SMN1; SMN2L3MBTL1AHRKDM4ELMNA
SCHEMBL9969506 0.78 SMN1; SMN2 (0.45) SMN1; SMN2L3MBTL1AHRBLMCHRM2
SCHEMBL29401687 0.77 SMN1; SMN2 (0.58) SMN1; SMN2L3MBTL1AHRKDM4ELMNA
SCHEMBL5041519 0.77 SMN1; SMN2 (0.58) SMN1; SMN2L3MBTL1AHRKDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6429117-B1 Method to create copper traps by modifying treatment on the dielectrics surface CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) 2002-08-06 US claimed
US-6429117-B1 Method to create copper traps by modifying treatment on the dielectrics surface CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) 2002-08-06 US disclosed