SCHEMBL7748403

SCHEMBL7748403

C=CC(=O)OC(Br)(Br)C(C)(C)CBr

nearest known ligand 0.34

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.34
ALDH1A1 P00352 4/20 0.33
TP53 P04637 3/20 0.33
HIF1A Q16665 3/20 0.33
CYP3A4 P08684 2/20 0.33
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HPGD P15428 1/20 0.33
HSD17B10 Q99714 1/20 0.32
THRB P10828 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10421675 0.85 ALDH1A1 (0.41) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL2794248 0.84 KEAP1 (0.32)
SCHEMBL9773443 0.84 KEAP1 (0.32)
SCHEMBL2794255 0.84 KEAP1 (0.32)
SCHEMBL372747 0.83 ALDH1A1 (0.48) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL9181169 0.79
SCHEMBL11274619 0.79 TSHR (0.34) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL14509494 0.78 TSHR (0.38) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL30504163 0.78 ALDH1A1 (0.43) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL9017631 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240026050-A1 FIRE RESISTANT COPOLYMER MATRIX COMPOSITE B/E AEROSPACE, INC. (US) 2024-01-25 US claimed
EP-4303240-A1 FIRE RESISTANT COPOLYMER MATRIX COMPOSITE B/E Aerospace, Inc. (US) 2024-01-10 EP claimed
US-6218074-B1 BLEND OF BROMOPOLYMER AND OTHER ADDITION POLYMER E. I. DU PONT DE NEMOURS AND COMPANY 2001-04-17 US claimed
US-12189289-B2 Photo-curable composition and methods for preparing cured film, optical component, circuit substrate, electrical component and replica mold using the same CANON KABUSHIKI KAISHA (JP) 2025-01-07 US disclosed
US-20240069438-A1 PHOTO-CURABLE COMPOSITION AND METHODS FOR PREPARING CURED FILM, OPTICAL COMPONENT, CIRCUIT SUBSTRATE, ELECTRICAL COMPONENT AND REPLICA MOLD USING THE SAME CANON KK (JP) 2024-02-29 US disclosed
US-20240026050-A1 FIRE RESISTANT COPOLYMER MATRIX COMPOSITE B/E AEROSPACE, INC. (US) 2024-01-25 US disclosed
EP-4303240-A1 FIRE RESISTANT COPOLYMER MATRIX COMPOSITE B/E Aerospace, Inc. (US) 2024-01-10 EP disclosed
CN-116410553-A Flame-retardant master batch and expanded polystyrene material 上海圣奎塑业有限公司 2023-07-11 CN disclosed