SCHEMBL7748508

SCHEMBL7748508

O=[N+]([O-])c1ccc2c3c(ccc([N+](=O)[O-])c13)CC2

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.63
HSD17B10 Q99714 2/20 0.63
ALDH1A1 P00352 1/20 0.63
ALOX15 P16050 1/20 0.63
BCHE P06276 1/20 0.52
ACHE P22303 1/20 0.52
CES1 P23141 1/20 0.52
HTR2A P28223 2/20 0.43
HTR2C P28335 2/20 0.43
HTR2B P41595 2/20 0.43
TDP1 Q9NUW8 5/20 0.39
TSHR P16473 4/20 0.39
MAPK1 P28482 1/20 0.38
USP2 O75604 1/20 0.38
ATM Q13315 1/20 0.38
GPR35 Q9HC97 2/20 0.37
HPGD P15428 2/20 0.36
PNMT P11086 1/20 0.36
TP53 P04637 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11546861 0.86 ALDH1A1 (0.54) CYP3A4HSD17B10ALDH1A1ALOX15BCHE
SCHEMBL5958783 0.83 BCHE (0.68) CYP3A4HSD17B10ALDH1A1ALOX15BCHE
SCHEMBL9550445 0.80 ALDH1A1 (0.49) CYP3A4HSD17B10ALDH1A1ALOX15BCHE
SCHEMBL28088070 0.80 BCHE (0.65) CYP3A4HSD17B10ALDH1A1ALOX15BCHE
Hydrochloric Acid SCHEMBL28070977 0.80 BCHE (0.65) CYP3A4HSD17B10ALDH1A1ALOX15BCHE
SCHEMBL29539827 0.78 ALDH1A1 (1.00) CYP3A4HSD17B10ALDH1A1ALOX15TDP1
SCHEMBL267240 0.78 ALDH1A1 (1.00) CYP3A4HSD17B10ALDH1A1ALOX15TDP1
SCHEMBL11548441 0.78 ALDH1A1 (0.46) CYP3A4HSD17B10ALDH1A1ALOX15BCHE
SCHEMBL11433383 0.74 ALDH1A1 (0.63) CYP3A4HSD17B10ALDH1A1ALOX15HTR2A
SCHEMBL30090126 0.73 BCHE (0.58) CYP3A4HSD17B10ALDH1A1ALOX15BCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180320-B1 Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2001-01-30 US disclosed
EP-0179921-B1 BASE MATERIAL HAVING A DYED SURFACE FILM AND DYEING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1990-08-08 EP disclosed
US-4675252-A Base material having a dyed membrane on the surface thereof, and method for dyeing a membrane thereon NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1987-06-23 US disclosed
EP-0179921-A1 BASE MATERIAL HAVING A DYED SURFACE FILM AND DYEING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1986-05-07 EP disclosed
US-4212813-A OXIDIZING ACENAPHTHENES, COBALT COMPOUND CATALYST NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1980-07-15 US disclosed
US-4205988-A Photochromic method involving an aromatic amine ASAHI KASEI K. K. (JP) 1980-06-03 US disclosed