Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.47 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | PKM | P14618 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7741665 | 0.84 | ALDH1A1 (0.48) | ALDH1A1PKML3MBTL1GAAKMT2A | |
| SCHEMBL12334393 | 0.80 | ALDH1A1 (0.47) | ALDH1A1PKML3MBTL1GAAKMT2A | |
| SCHEMBL20991845 | 0.79 | PKM (0.42) | DPP8DPP9ALDH1A1PKML3MBTL1 | |
| SCHEMBL12705429 | 0.79 | DPP8 (0.43) | DPP8DPP9ALDH1A1PKML3MBTL1 | |
| SCHEMBL685914 | 0.79 | NPSR1 (0.41) | DPP8DPP9ALDH1A1L3MBTL1GAA | |
| SCHEMBL14802433 | 0.78 | ALDH1A1 (0.38) | DPP8DPP9ALDH1A1PKML3MBTL1 | |
| SCHEMBL25527396 | 0.76 | PKM (0.40) | ALDH1A1PKML3MBTL1GAAKMT2A | |
| Trifluoroacetic Acid SCHEMBL30685017 | 0.76 | DPP8 (0.42) | DPP8DPP9PKMEPHX2 | |
| SCHEMBL7748923 | 0.76 | ALDH1A1 (0.47) | ALDH1A1PKML3MBTL1GAAKMT2A | |
| SCHEMBL31732784 | 0.75 | GRIN2D (0.47) | DPP8DPP9ALDH1A1PKMKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6238842-B1 | SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-29 | — | — | US | disclosed |