Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.41 |
| ▸ | CA12 | O43570 | 2/20 | 0.41 |
| ▸ | CA7 | P43166 | 2/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | APLNR | P35414 | 2/20 | 0.33 |
| ▸ | CES2 | O00748 | 1/20 | 0.33 |
| ▸ | CES1 | P23141 | 1/20 | 0.33 |
| ▸ | LOXL2 | Q9Y4K0 | 3/20 | 0.32 |
| ▸ | LOX | P28300 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24629023 | 1.00 | CA1 (0.41) | CA1CA12CA7CA14CA2 | |
| SCHEMBL11889594 | 1.00 | CA1 (0.41) | CA1CA12CA7CA14CA2 | |
| SCHEMBL3155782 | 1.00 | CA1 (0.41) | CA1CA12CA7CA14CA2 | |
| SCHEMBL777806 | 0.96 | CA1 (0.36) | CA1CA12CA7CA14CA2 | |
| SCHEMBL491332 | 0.89 | APLNR (0.35) | CA1CA12CA7CA14APLNR | |
| SCHEMBL2104362 | 0.84 | CA1 (0.32) | CA1CA12CA7CA14CA2 | |
| SCHEMBL15290539 | 0.84 | TSHR (0.43) | CA1CA12CA7CA14CA2 | |
| SCHEMBL2411179 | 0.81 | — | — | |
| Succinic Acid SCHEMBL5704139 | 0.80 | ALDH1A1 (0.48) | CES2CES1EPHX2EPHX1ALDH1A1 | |
| SCHEMBL2104041 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 241 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2481760-B1 | INITIATOR SYSTEM FOR CATIONIC POLYMERIZATION AND POLYMERIZATION METHOD USING SAME | CHINA PETROLEUM & CHEM CORP (CN) | 2021-05-05 | — | — | EP | claimed |
| EP-0249881-B1 | LIQUID CRYSTAL ALIGNING AGENT | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1990-10-03 | — | — | EP | claimed |
| US-12100809-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-09-24 | — | — | US | disclosed |
| US-20230288610-A1 | WAVELENGTH SELECTIVE ABSORPTION FILTER AND DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-09-14 | — | — | US | disclosed |
| US-20230288610-A1 | WAVELENGTH SELECTIVE ABSORPTION FILTER AND DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-09-14 | — | — | US | disclosed |
| WO-2023127708-A1 | EPOXY RESIN COMPOSITION | 住友精化株式会社 | 2023-07-06 | — | — | WO | disclosed |
| WO-2023127709-A1 | EPOXY RESIN COMPOSITION | 住友精化株式会社 | 2023-07-06 | — | — | WO | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| CN-111393908-B | Quantum dot ink and preparation method thereof | 中国科学院苏州纳米技术与纳米仿生研究所 | 2022-11-29 | — | — | CN | disclosed |
| US-20220291585-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2022-09-15 | — | — | US | disclosed |
| US-20220149436-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| EP-0309955-A1 | Aromatic sulfide/sulfone polymer production | PHILLIPS PETROLEUM COMPANY (US) | 1989-04-05 | — | — | EP | disclosed |
| US-4748208-A | FLUOROPOLYMER, BIS/PHOSPHINE/IMINIUM HALIDE, POLYHYDROXY CURING AGENT | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1988-05-31 | — | — | US | disclosed |
| EP-0182299-A2 | A curable fluoroelastomer composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1986-05-28 | — | — | EP | disclosed |
| EP-0005775-B1 | ARTICLE COMPRISING A SUBSTRATE AND AN OVERLYING PROCESSING LAYER OF ACTINIC RADIATION-SENSITIVE MATERIAL AND PROCESS FOR FABRICATION OF THE ARTICLE | Western Electric Company, Incorporated (US) | 1983-09-21 | — | — | EP | disclosed |
| US-4289845-A | Fabrication based on radiation sensitive resists and related products | BELL TELEPHONE LABORATORIES, INC. (US) | 1981-09-15 | — | — | US | disclosed |
| US-4247694-A | PHOTOSTABILIZERS FOR POLYMERS | CIBA-GEIGY CORPORATION (US) | 1981-01-27 | — | — | US | disclosed |
| EP-0005775-A1 | Article comprising a substrate and an overlying processing layer of actinic radiation-sensitive material and process for fabrication of the article | Western Electric Company, Incorporated (US) | 1979-12-12 | — | — | EP | disclosed |
| US-4125525-A | Aromatic sulfide/sulfone polymer production | PHILLIPS PETROLEUM COMPANY (US) | 1978-11-14 | — | — | US | disclosed |
| US-3949001-A | Process for producing aryl alpha-haloalkyl sulfones | SOUTHERN ILLINOIS UNIVERSITY FOUNDATION (US) | 1976-04-06 | — | — | US | disclosed |