SCHEMBL7757142

SCHEMBL7757142

CCCCC(CCCC)O[Si](CCCC)(OC)OC

nearest known ligand 0.40

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
DNM1 Q05193 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5595949 0.89 LMNA (0.36) LMNADNM1
SCHEMBL28492495 0.88 LMNA (0.46) LMNADNM1
SCHEMBL28496866 0.88 LMNA (0.46) LMNADNM1
SCHEMBL14656890 0.88 LMNA (0.46) LMNADNM1
SCHEMBL11026294 0.88 LMNA (0.46) LMNADNM1
SCHEMBL7176945 0.86 LMNA (0.34) LMNADNM1
SCHEMBL2761426 0.82 LMNA (0.41) LMNADNM1
SCHEMBL28550781 0.81 LMNA (0.40) LMNADNM1
SCHEMBL5596190 0.79 LMNA (0.33) LMNA
SCHEMBL455159 0.78 LMNA (0.42) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114460809-A Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same 东丽株式会社 2022-05-10 CN disclosed
CN-109071366-B Surface applied corrosion inhibitor 建筑研究和技术有限公司 2022-05-10 CN disclosed
CN-108885399-B Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same 东丽株式会社 2022-03-15 CN disclosed
CN-108604062-B Negative photosensitive resin composition, cured film, display device having cured film, and method for producing same 东丽株式会社 2021-11-09 CN disclosed
US-11086219-B2 Negative-type photosensitive resin composition, cured film, display device that includes the cured film, and production method therefor TORAY INDUSTRIES, INC. (JP) 2021-08-10 US disclosed
CN-107077070-B Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device 东丽株式会社 2020-06-16 CN disclosed
EP-3203320-B9 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE TORAY INDUSTRIES (JP) 2020-05-06 EP disclosed
EP-3203320-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE TORAY INDUSTRIES (JP) 2019-10-23 EP disclosed
US-10409163-B2 Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device TORAY INDUSTRIES, INC. (JP) 2019-09-10 US disclosed
US-20180356729-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, DISPLAY DEVICE THAT INCLUDES THE CURED FILM, AND PRODUCTION METHOD THEREFOR TORAY INDUSTRIES, INC. (JP) 2018-12-13 US disclosed
CN-107710890-A Method for manufacturing printed wiring board, surface-treated copper foil, laminate, printed wiring board, semiconductor package, and electronic device JX金属株式会社 2018-02-16 CN disclosed
US-20170285477-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2017-10-05 US disclosed
US-20170243737-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2017-08-24 US disclosed
EP-3203320-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Toray Industries, Inc. (JP) 2017-08-09 EP disclosed
EP-3125274-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE Toray Industries, Inc. (JP) 2017-02-01 EP disclosed
CN-104685980-A Production method for multilayer printed wiring board, and base material JX NIPPON MINING & METALS CORP 2015-06-03 CN disclosed
EP-0713153-B1 Toner for developing electrostatic images, two component type developer, developing method, image forming method, heat fixing method, and process for producing toner CANON KK (JP) 2001-03-14 EP disclosed
US-5824442-A CONTROLLING DEVELOPMENT AND DEVELOPMENT FOR ELECTROSTATIC IMAGES WITH THIN FILMS CANON KABUSHIKI KAISHA (JP) 1998-10-20 US disclosed
US-5707770-A TITANIA OR ALUMINA PARTICLES SURFACE TREATED WITH A SILICON COMPOUND OR SILICONE OIL, IMPROVED PERFORMANCE IN HIGH HUMIDITY CANON KABUSHIKI KAISHA (JP) 1998-01-13 US disclosed
EP-0713153-A2 Toner for developing electrostatic images, two component type developer, developing method, image forming method, heat fixing method, and process for producing toner CANON KABUSHIKI KAISHA (JP) 1996-05-22 EP disclosed