SCHEMBL7763367

SCHEMBL7763367

CCCC(=O)OC(=O)/C=C\C(=O)OC(=O)CCC

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.67
ATM Q13315 1/20 0.43
HCAR2 Q8TDS4 6/20 0.40
CES2 O00748 1/20 0.39
CES1 P23141 1/20 0.39
HDAC3 O15379 4/20 0.38
HDAC1 Q13547 4/20 0.38
HDAC2 Q92769 4/20 0.38
HDAC8 Q9BY41 4/20 0.38
FFAR3 O14843 3/20 0.38
KEAP1 Q14145 1/20 0.38
NFE2L2 Q16236 1/20 0.38
TSHR P16473 1/20 0.36
POLB P06746 1/20 0.34
POLA1 P09884 1/20 0.34
HDAC6 Q9UBN7 1/20 0.33
MAPT P10636 1/20 0.32
RAB9A P51151 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28098612 1.00 ALDH1A1 (0.67) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL6403998 0.91 ALDH1A1 (0.56) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL6403988 0.91 ALDH1A1 (0.56) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL28896894 0.91 ALDH1A1 (0.56) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL1695440 0.89 ALDH1A1 (0.58) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL420743 0.89 ALDH1A1 (0.58) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL5438667 0.86 ATM (0.50) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL26639747 0.85 ALDH1A1 (0.54) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL26639751 0.85 ALDH1A1 (0.54) ALDH1A1ATMHCAR2CES2CES1
SCHEMBL28646321 0.84 ATM (0.71) ALDH1A1ATMHCAR2TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111458979-B Photoresist composition, preparation method and application thereof 潍坊星泰克微电子材料有限公司 2024-04-19 CN disclosed
CN-111458979-A Photoresist composition and preparation method and application thereof 潍坊星泰克微电子材料有限公司 2020-07-28 CN disclosed
EP-1093498-A1 METHOD FOR IMPROVING APPEARANCE IN COMPOSITE COLOR-PLUS-CLEAR COATINGS, AND COMPOSITIONS FOR USE THEREIN BASF CORPORATION (US) 2001-04-25 EP disclosed
WO-1999057213-A1 METHOD FOR IMPROVING APPEARANCE IN COMPOSITE COLOR-PLUS-CLEAR COATINGS, AND COMPOSITIONS FOR USE THEREIN BASF CORPORATION (DE) 1999-11-11 WO disclosed
EP-0545947-A4 PROCESS FOR MAKING ETHANOL SOLUTIONS OF ALKYL HALF-ESTERS OF COPOLYMERS OF MALEIC ANHYDRIDE AND A C 1?-C 4? ALKYL VINYL ETHER 1993-07-21 EP disclosed
EP-0545947-A1 PROCESS FOR MAKING ETHANOL SOLUTIONS OF ALKYL HALF-ESTERS OF COPOLYMERS OF MALEIC ANHYDRIDE AND A C 1?-C 4? ALKYL VINYL ETHER. ISP INVESTMENTS INC (US) 1993-06-16 EP disclosed
WO-1992004405-A1 PROCESS FOR MAKING ETHANOL SOLUTIONS OF ALKYL HALF-ESTERS OF COPOLYMERS OF MALEIC ANHYDRIDE AND A C1-C4 ALKYL VINYL ETHER ISP INVESTMENTS INC. (US) 1992-03-19 WO disclosed