SCHEMBL7763649

SCHEMBL7763649

Cc1ccc(C(O)(c2ccccc2)C(O)(c2ccccc2)c2ccc(C)cc2C)c(C)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.52
KMT2A Q03164 4/20 0.52
LMNA P02545 1/20 0.52
MAPT P10636 1/20 0.52
GPR55 Q9Y2T6 1/20 0.52
CASR P41180 4/20 0.47
MAPK1 P28482 2/20 0.39
CYP3A4 P08684 1/20 0.39
TP53 P04637 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
ACSS2 Q9NR19 2/20 0.39
KIF11 P52732 1/20 0.39
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38
XBP1 P17861 1/20 0.38
HTT P42858 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
CYP19A1 P11511 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7768805 0.85 MEN1 (0.42) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL7938775 0.81 MEN1 (0.46) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL7030617 0.79 CYP3A4 (0.44) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL28450374 0.79 MEN1 (0.48) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL7178497 0.78 ESR1 (0.47) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL6546944 0.78 MAPT (0.47) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL11621119 0.78 LMNA (0.47) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL9667981 0.78 MEN1 (0.50) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL11622216 0.77 MAPT (0.46) MEN1KMT2ALMNAMAPTGPR55
SCHEMBL2862802 0.74 MEN1 (0.50) MEN1KMT2ALMNAMAPK1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0800116-B1 Photoresist composition MITSUBISHI CHEM CORP (JP) 2001-08-22 EP disclosed
US-5759736-A Photoresist composition MITSUBISHI CHEMICAL CORPORATION (JP) 1998-06-02 US disclosed
EP-0800116-A1 Photoresist composition Mitsubishi Chemical Corporation (JP) 1997-10-08 EP disclosed