Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 2/20 | 0.41 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.41 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.41 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.41 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.41 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.41 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.41 |
| ▸ | BACE1 | P56817 | 2/20 | 0.41 |
| ▸ | PELI1 | Q96FA3 | 1/20 | 0.39 |
| ▸ | HNF4A | P41235 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.37 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.36 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.36 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.36 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL284707 | 0.88 | NFE2L2 (0.47) | BACE1PELI1NFE2L2 | |
| (Z)-1,2-Diphenylethene SCHEMBL27556287 | 0.88 | NFE2L2 (0.47) | BACE1PELI1NFE2L2 | |
| SCHEMBL27643067 | 0.87 | GRIN2D (0.48) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL284706 | 0.87 | GRIN2D (0.48) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Ammonia Solution, Strong SCHEMBL27406726 | 0.86 | NFE2L2 (0.46) | BACE1PELI1NFE2L2 | |
| SCHEMBL5012429 | 0.85 | GRIN2D (0.42) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL5008805 | 0.85 | ALDH1A1 (0.41) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL9807162 | 0.81 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL1342965 | 0.80 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL3712275 | 0.80 | ALDH1A1 (0.46) | BACE1ALDH1A1HSD17B10HPGDMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0845008-B1 | FUNCTIONALIZED POLYBUTADIENE RESINS, METHOD FOR MAKING SAME AND THEIR USES | SARTOMER CO INC (US) | 2001-07-04 | — | — | EP | claimed |
| CN-114868048-B | Optical film, optical laminate, functional glass, and head-up display | 日本化药株式会社 | 2025-02-25 | — | — | CN | disclosed |
| CN-114868048-A | Optical film, optical laminate, functional glass, and head-up display | 日本化药株式会社 | 2022-08-05 | — | — | CN | disclosed |
| EP-0588950-B2 | METHOD FOR TREATING FLUOROALUMINOSILICATE GLASS | MINNESOTA MINING & MFG (US) | 2017-10-11 | — | — | EP | disclosed |
| US-6096671-A | SINTERING A HEXAGONAL BORON NITRIDE POWDER COMPRISING PARTICLES CONSISTING ESSENTIALLY OF SCALEY PRIMARY PARTICLES OF HEXAGONAL BORON NITRIDE IN PINECONE FORM AND AGGREGATED TO EACH OTHER WITHOUT A BINDER AND WITHOUT ORIENTATION | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2000-08-01 | — | — | US | disclosed |
| US-5854155-A | Hexagonal system boron nitride powder | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1998-12-29 | — | — | US | disclosed |
| US-5821031-A | AN ULTRAVIOLET CURABLE RESIN CONTAINING AN ETHYLENICALLY UNSATURATED MONOMER HAVING AN EPOXY GROUP, (METH)ACRYLIC ACID, A SATURATED OR UNSATURATED POLYBASIC ANHYDRIDE AND AN EPOXY COMPOUND | GOO CHEMICAL CO., LTD. (JP) | 1998-10-13 | — | — | US | disclosed |
| EP-0576622-B1 | LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK CO (US) | 1997-11-05 | — | — | EP | disclosed |
| EP-0472228-B1 | Radiation-sensitive composition containing a vinyl pyrrolidone polymer and use thereof in lithographic printing plates | EASTMAN KODAK CO (US) | 1997-09-10 | — | — | EP | disclosed |
| EP-0588950-B1 | METHOD FOR TREATING FLUOROALUMINOSILICATE GLASS | MINNESOTA MINING & MFG (US) | 1997-03-12 | — | — | EP | disclosed |
| US-5061601-A | Radiation-sensitive composition containing a vinyl pyrrolidone polymer and use thereof in lithographic printing plates | EASTMAN KODAK COMPANY (US) | 1991-10-29 | — | — | US | disclosed |
| US-5061600-A | Radiation-sensitive composition containing both a vinyl pyrrolidone polymer and an unsaturated polyester and use thereof in lithographic printing plates | EASTMAN KODAK COMPANY (US) | 1991-10-29 | — | — | US | disclosed |
| US-5053315-A | Additive improves processibility and ink receptivity | EASTMAN KODAK COMPANY (US) | 1991-10-01 | — | — | US | disclosed |
| US-5045432-A | Negative working lithography printing plates | EASTMAN KODAK COMPANY (US) | 1991-09-03 | — | — | US | disclosed |
| US-5043250-A | Negative working; shelf life, image contrast | EASTMAN KODAK COMPANY (US) | 1991-08-27 | — | — | US | disclosed |
| EP-0340244-A1 | HIGH SPEED AQUEOUS DEVELOPABLE RADIATION-SENSITIVE COMPOSITION AND PRINTING PLATE CONTAINING SAME | EASTMAN KODAK COMPANY (US) | 1989-11-08 | — | — | EP | disclosed |
| WO-1988005929-A1 | HIGH SPEED AQUEOUS DEVELOPABLE RADIATION-SENSITIVE COMPOSITION AND PRINTING PLATE CONTAINING SAME | EASTMAN KODAK COMPANY (US) | 1988-08-11 | — | — | WO | disclosed |
| US-4101326-A | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters | EASTMAN KODAK COMPANY (US) | 1978-07-18 | — | — | US | disclosed |
| US-3997509-A | FIREPROOFING | SOLVAY & CIE (BE) | 1976-12-14 | — | — | US | disclosed |
| US-3979368-A | COPOLYMERIZATION OF MALEIC ANHYDRIDE WITH AN A-EPIHALOHYDRIN | SOLVAY & CIE (BE) | 1976-09-07 | — | — | US | disclosed |