SCHEMBL7777007

SCHEMBL7777007

CCCCCCCNC(C)CC

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 8/20 0.46
KDM4E B2RXH2 3/20 0.44
ALDH1A1 P00352 4/20 0.43
TSHR P16473 2/20 0.43
ADH1B P00325 2/20 0.41
ADH1C P00326 2/20 0.41
ADH1A P07327 2/20 0.41
ADH4 P08319 2/20 0.41
ADH7 P40394 2/20 0.41
HTT P42858 1/20 0.40
THRB P10828 1/20 0.40
CNR1 P21554 1/20 0.37
CNR2 P34972 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27493775 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL19963745 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL7775120 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL27371938 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL25122655 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL7770667 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL24508589 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL19205925 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL21808586 1.00 EPHX1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B
SCHEMBL24596012 0.97 ALDH1A1 (0.46) EPHX1KDM4EALDH1A1TSHRADH1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108602955-B Photocuring method, compound used in photocuring method, and composition 富士胶片和光纯药株式会社 2021-08-06 CN disclosed
CN-107848963-B Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same 富士胶片和光纯药株式会社 2020-11-03 CN disclosed
CN-110678500-A Photo-or thermosetting method and curable resin composition 富士胶片和光纯药株式会社 2020-01-10 CN disclosed
CN-108602955-A The compound and composition used in process for photocuring, the process for photocuring 富士胶片和光纯药株式会社 2018-09-28 CN disclosed
CN-107848963-A Alkali-producing agent and/or radical-generating agent having acid resistance, and curable resin composition containing same 和光纯药工业株式会社 2018-03-27 CN disclosed
WO-2017197046-A1 C3-CARBON LINKED GLUTARIMIDE DEGRONIMERS FOR TARGET PROTEIN DEGRADATION C4 THERAPEUTICS, INC. (US) 2017-11-16 WO disclosed
WO-2017197055-A1 HETEROCYCLIC DEGRONIMERS FOR TARGET PROTEIN DEGRADATION C4 THERAPEUTICS, INC. (US) 2017-11-16 WO disclosed
EP-0838508-B1 Aqueous ink composition for use in an ink-jet printer SEIKO EPSON CORP (JP) 2001-08-29 EP disclosed
US-5871572-A COLORANT, WATER, A WATER-SOLUBLE ORGANIC SOLVENT, AND PECTIC ACID SEIKO EPSON CORPORATION (JP) 1999-02-16 US disclosed
EP-0838508-A2 Aqueous ink composition for use in an ink-jet printer SEIKO EPSON CORPORATION (JP) 1998-04-29 EP disclosed