⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8758 | 0.75 | — | — | |
| SCHEMBL895220 | 0.75 | — | — | |
| SCHEMBL11792566 | 0.71 | — | — | |
| SCHEMBL2409777 | 0.71 | — | — | |
| SCHEMBL767081 | 0.71 | — | — | |
| SCHEMBL335750 | 0.69 | — | — | |
| Ethylene SCHEMBL6511490 | 0.68 | — | — | |
| SCHEMBL797340 | 0.68 | — | — | |
| SCHEMBL4254754 | 0.67 | — | — | |
| Dimethylamine SCHEMBL7582757 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103476895-B | Adhesive, adhesive material using same, and method for using same | 日立化成株式会社 | 2017-02-15 | — | — | CN | disclosed |
| CN-103476894-B | Adhesive, adhesive material using same, and method for using same | 日立化成株式会社 | 2017-02-15 | — | — | CN | disclosed |
| CN-103459544-B | Adhesive and adhesive material using same, and usage method therefor | 日立化成株式会社 | 2017-02-15 | — | — | CN | disclosed |
| US-20140117280-A1 | OXYGEN ABSORBER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-05-01 | — | — | US | disclosed |
| EP-2711077-A1 | OXYGEN ABSORBER | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-03-26 | — | — | EP | disclosed |
| EP-0606096-B1 | OO-t-alkyl O-polycaprolactone monoperoxycarbonates | ATOFINA CHEM INC (US) | 2001-09-12 | — | — | EP | disclosed |
| EP-0750230-B1 | Negative type photosensitive compositions | FUJI PHOTO FILM CO LTD (JP) | 1999-02-10 | — | — | EP | disclosed |
| US-5725994-A | CONTAINING AN ACID PRECURSOR AND A HYDROXYL GROUP CONTAINING LINEAR POLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-10 | — | — | US | disclosed |
| EP-0750230-A2 | Negative type photosensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-27 | — | — | EP | disclosed |
| US-5496875-A | Derivatives of 2,2,6,6-tetramethyl-4-piperidinol for use as light stabilizers, heat stabilizers and oxidation stabilizers for organic materials | CIBA-GEIGY CORPORATION (US) | 1996-03-05 | — | — | US | disclosed |
| US-5132387-A | Polyme bound | ELF ATOCHEM NORTH AMERICA, INC. (US) | 1992-07-21 | — | — | US | disclosed |
| EP-0494639-A2 | Hindered amine light stabilizer hydrazides for stabilizing polyurethane, polyurea and polyurethane-polyurea polymers | ELF ATOCHEM NORTH AMERICA, INC. (US) | 1992-07-15 | — | — | EP | disclosed |
| US-5116976-A | HINDERED AMINE LIGHT STABILIZER HYDRAZIDES | ATOCHEM NORTH AMERICA, INC (US) | 1992-05-26 | — | — | US | disclosed |
| EP-0467344-A1 | Hindered amine light stabilizer hydrazides | ELF ATOCHEM NORTH AMERICA, INC. (US) | 1992-01-22 | — | — | EP | disclosed |
| EP-0409840-A4 | BENZOTRIAZOLE AND OXANILIDE UV ABSORBER HYDRAZIDES | — | 1991-09-04 | — | — | EP | disclosed |
| US-5041545-A | 2-hydroxybenzophenone hydrazides and derivatives thereof | ATOCHEM NORTH AMERICA, INC. (US) | 1991-08-20 | — | — | US | disclosed |
| EP-0409840-A1 | BENZOTRIAZOLE AND OXANILIDE UV ABSORBER HYDRAZIDES | ELF ATOCHEM NORTH AMERICA, INC. (US) | 1991-01-30 | — | — | EP | disclosed |
| US-4980420-A | Benzotriazole and oxanilide UV absorber hydrazides | ATOCHEM NORTH AMERICA, INC. (US) | 1990-12-25 | — | — | US | disclosed |
| WO-1990009369-A1 | BENZOTRIAZOLE AND OXANILIDE UV ABSORBER HYDRAZIDES | ATOCHEM NORTH AMERICA, INC. (US) | 1990-08-23 | — | — | WO | disclosed |
| US-4399210-A | O-NAPHTHOQUINONEDIAZIDE AND A DISCOLORING AGENT | FUJI PHOTO FILM COMPANY LTD. (JP) | 1983-08-16 | — | — | US | disclosed |