⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5364264 | 0.86 | — | — | |
| SCHEMBL22007119 | 0.84 | TSHR (0.44) | — | |
| SCHEMBL681377 | 0.76 | — | — | |
| SCHEMBL167379 | 0.76 | TSHR (0.44) | — | |
| SCHEMBL27869609 | 0.76 | CA12 (0.50) | — | |
| SCHEMBL2504827 | 0.75 | — | — | |
| SCHEMBL17073243 | 0.73 | — | — | |
| SCHEMBL19482 | 0.72 | — | — | |
| SCHEMBL13822687 | 0.72 | CYP2C19 (0.58) | — | |
| SCHEMBL12703422 | 0.71 | ADRB2 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1144533-A3 | HIGH TEMPERATURE POLYOLEFIN BASED ADHESIVE FILM WITH IMPROVED POLARITY FOR ADHERING TO POLYURETHANE FOAMS | The Dow Chemical Company (US) | 2002-03-13 | — | — | EP | disclosed |
| EP-1144533-A2 | HIGH TEMPERATURE POLYOLEFIN BASED ADHESIVE FILM WITH IMPROVED POLARITY FOR ADHERING TO POLYURETHANE FOAMS | Dow Global Technologies Inc. (US) | 2001-10-17 | — | — | EP | disclosed |
| US-6084029-A | POLYOLEFINS GRAFTED WITH AN UNSATURATED CARBOXYLIC ACID AND/OR AN UNSATURATED CARBOXYLIC ACID ANHYDRIDE AND A POLYMERIC OR OLIGOMERIC POLYAMINE, FOR EXTRUSION OR CASTING | THE DOW CHEMICAL COMPANY (US) | 2000-07-04 | — | — | US | disclosed |
| WO-2000006660-A2 | HIGH TEMPERATURE POLYOLEFIN BASED ADHESIVE FILM WITH IMPROVED POLARITY FOR ADHERING TO POLYURETHANE FOAMS | THE DOW CHEMICAL COMPANY (US) | 2000-02-10 | — | — | WO | disclosed |