Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | ADH1B | P00325 | 2/20 | 0.38 |
| ▸ | ADH1C | P00326 | 2/20 | 0.38 |
| ▸ | ADH1A | P07327 | 2/20 | 0.38 |
| ▸ | ADH7 | P40394 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | ADH4 | P08319 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | KDM1A | O60341 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22007119 | 0.91 | TSHR (0.44) | TSHRALDH1A1ADH1BADH1CADH1A | |
| SCHEMBL5963003 | 0.83 | LMNA (0.37) | KMT2AMEN1HPGDLMNA | |
| SCHEMBL14883168 | 0.81 | PAOX (0.38) | KMT2AMEN1CYP2C19GLAEPHX1 | |
| SCHEMBL1961911 | 0.80 | TSHR (0.46) | TSHRALDH1A1ADH1BADH1CADH1A | |
| SCHEMBL5364264 | 0.79 | — | — | |
| SCHEMBL94272 | 0.77 | — | — | |
| SCHEMBL800624 | 0.77 | — | — | |
| SCHEMBL19482 | 0.76 | — | — | |
| SCHEMBL7786138 | 0.76 | — | — | |
| SCHEMBL10600362 | 0.74 | TSHR (0.56) | TSHRALDH1A1ADH1BADH1CADH1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1031 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7105270-B2 | Fluoroaliphatic group-containing copolymer | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-12 | — | — | US | claimed |
| US-4087574-A | PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS | FUJI PHOTO FILM CO., LTD. (JA) | 1978-05-02 | — | — | US | claimed |
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| WO-2025132182-A2 | POST-EXPOSURE BAKE LESS CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2025-06-26 | — | — | WO | disclosed |
| CN-120118458-A | Curable composition, resin, and cured product | 东京应化工业株式会社 | 2025-06-10 | — | — | CN | disclosed |
| US-12312489-B2 | Curable composition, cured product and method for forming insulating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-27 | — | — | US | disclosed |
| CN-120044752-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-120044751-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-119937242-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-06 | — | — | CN | disclosed |
| WO-2025011754-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2025-01-16 | — | — | WO | disclosed |
| CN-112394438-B | Method for manufacturing color filter, and resin composition | 东京应化工业株式会社 | 2025-01-03 | — | — | CN | disclosed |
| US-4087574-A | PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS | FUJI PHOTO FILM CO., LTD. (JA) | 1978-05-02 | — | — | US | disclosed |
| US-4065435-A | OXIDATION-REDUCTION PROPERTIES, ACRYLIC | FUJI PHOTO FILM CO., LTD. (JA) | 1977-12-27 | — | — | US | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4054717-A | CLAYS, WATER SOLUBLE POLYMER HAVING AMINE GROUPS | ROHM AND HAAS COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
| US-4054722-A | PHOTOGRAPHY | FUJI PHOTO FILM CO., LTD. (JA) | 1977-10-18 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-3936429-A | Reactive polymer | FUJI PHOTO FILM CO., LTD. (JA) | 1976-02-03 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |