SCHEMBL7786292

SCHEMBL7786292

O=P(CN1CCOCC1)(c1ccccc1)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.58
CYP2C19 P33261 2/20 0.51
CYP3A4 P08684 1/20 0.51
KMT2A Q03164 4/20 0.45
MEN1 O00255 2/20 0.45
MAPT P10636 2/20 0.45
POLB P06746 1/20 0.45
SIGMAR1 Q99720 1/20 0.45
TSHR P16473 1/20 0.44
MAPK1 P28482 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
LMNA P02545 2/20 0.44
SMN1; SMN2 Q16637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24359437 0.87 CYP3A4 (0.58) ALDH1A1CYP2C19CYP3A4KMT2AMEN1
SCHEMBL6825477 0.72 POLB (0.51) ALDH1A1KMT2AMEN1MAPTPOLB
SCHEMBL9906965 0.72 HPGD (0.52) ALDH1A1CYP2C19KMT2AMEN1MAPT
SCHEMBL6828218 0.71 ALDH1A1 (0.54) ALDH1A1KMT2AMEN1MAPTPOLB
SCHEMBL6825479 0.70 ALDH1A1 (0.51) ALDH1A1CYP2C19CYP3A4KMT2AMEN1
SCHEMBL11125672 0.69 ALDH1A1 (0.51) ALDH1A1CYP2C19KMT2AMEN1MAPT
SCHEMBL11791899 0.69 POLB (0.50) ALDH1A1CYP2C19KMT2AMEN1MAPT
SCHEMBL22014317 0.68 CFTR (0.57) ALDH1A1CYP2C19CYP3A4KMT2AMEN1
SCHEMBL102338 0.67 SIGMAR1 (0.71) ALDH1A1KMT2AMEN1POLBSIGMAR1
SCHEMBL6200777 0.67 SIGMAR1 (0.71) ALDH1A1KMT2AMEN1POLBSIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118795727-A Photosensitive resin composition, cured film pattern and method for producing the same 奇美实业股份有限公司 2024-10-18 CN disclosed
CN-118363269-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-07-19 CN disclosed
CN-118226707-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-21 CN disclosed
CN-118210199-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
CN-118210200-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
CN-118210196-A Photosensitive resin composition, cured film pattern and method for producing the same 奇美实业股份有限公司 2024-06-18 CN disclosed
CN-117289549-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2023-12-26 CN disclosed
EP-0971919-B1 PROCESS FOR PREPARATION OF 4H-4-OXO-QUINOLIZINE-3-CARBOXYLIC ACID DERIVATIVES ABBOTT LAB (US) 2001-10-31 EP disclosed
EP-0971919-A1 PROCESS FOR PREPARATION OF 4H-4-OXO-QUINOLIZINE-3-CARBOXYLIC ACID DERIVATIVES Abbott Laboratories (US) 2000-01-19 EP disclosed
WO-1998038191-A1 PROCESS FOR PREPARATION OF 4H-4-OXO-QUINOLIZINE-3-CARBOXYLIC ACID DERIVATIVES ABBOTT LABORATORIES (US) 1998-09-03 WO disclosed
US-5693813-A Process for preparation of 4H-4-oxo-quinolizine-3-carboxylic acid ABBOTT LABORATORIES (US) 1997-12-02 US disclosed