SCHEMBL7787347

SCHEMBL7787347

CCCC(O)CCC(C)(C)O

nearest known ligand 0.43

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.43
ACACB O00763 1/20 0.33
ACACA Q13085 1/20 0.33
NFKB1 P19838 1/20 0.32
FDPS P14324 1/20 0.32
TSHR P16473 1/20 0.31
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10257119 0.89 ALDH1A1 (0.53) ALDH1A1ACACBACACATSHR
SCHEMBL6567348 0.88 ALDH1A1 (0.41) ALDH1A1ACACBACACANFKB1FDPS
SCHEMBL16074714 0.86 NFKB1 (0.42) ALDH1A1ACACBACACANFKB1FDPS
SCHEMBL16074897 0.84 NFKB1 (0.50) ALDH1A1ACACBACACANFKB1FDPS
SCHEMBL10898459 0.82 FFAR1 (0.50) ACACBACACANFKB1FDPS
SCHEMBL16074778 0.82 FFAR1 (0.50) ACACBACACANFKB1FDPS
SCHEMBL16074913 0.82 FFAR1 (0.50) ACACBACACANFKB1FDPS
SCHEMBL16074950 0.82 FFAR1 (0.50) ACACBACACANFKB1FDPS
SCHEMBL16074941 0.82 FFAR1 (0.50) ACACBACACANFKB1FDPS
SCHEMBL16077460 0.82 FFAR1 (0.50) ACACBACACANFKB1FDPS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20010001279-A1 Stable microbubble suspensions as enhancement agents for ultrasound echography BRACCO INTERNATIONAL BV 2001-05-17 US claimed
CN-117203303-A Dielectric thermal management fluid and method of use thereof 卡斯特罗尔有限公司 2023-12-08 CN disclosed
US-9188866-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-17 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed