SCHEMBL779265

SCHEMBL779265

O=S(=O)(O)CC(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28133221 0.97
Fluoride SCHEMBL28386061 0.97
SCHEMBL575440 0.89 SLC22A6 (0.37)
1,3-Propanediol SCHEMBL575972 0.87 SLC22A6 (0.36)
1,4-Butanediol SCHEMBL575572 0.87 SLC22A6 (0.36)
Hydroquinone SCHEMBL575985 0.83 LMNA (0.44)
Propylene Glycol SCHEMBL575901 0.83 TDP1 (0.46)
SCHEMBL575587 0.79 ALDH1A1 (0.32)
1,3-Butanediol SCHEMBL575667 0.78 TP53 (0.31)
SCHEMBL27961486 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250020997-A1 PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-01-16 US disclosed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
CN-117117316-A Electrolyte high-voltage stabilizing additive, lithium battery electrolyte and lithium ion battery 清华大学 2023-11-24 CN disclosed
US-20230176481-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-06-08 US disclosed
CN-115911573-A Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery using same 三菱化学株式会社 2023-04-04 CN disclosed
US-20210289794-A1 COMPOSITIONS AND RELATED METHODS FOR AGRICULTURE FLAGSHIP PIONEERING INNOVATIONS V, INC. 2021-09-23 US disclosed
EP-3847506-A1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL Merck Patent GmbH (DE) 2021-07-14 EP disclosed
CN-107922362-B 1,3, 4-oxadiazole sulfonamide derivative compounds as histone deacetylase 6 inhibitors and pharmaceutical compositions containing the same 株式会社钟根堂 2021-06-15 CN disclosed
EP-3735481-A1 METHODS FOR FABRICATING HIGH RESOLUTION DNA ARRAY AND ITS APPLICATION IN SEQUENCING Centrillion Technology Holdings Corporation (KY) 2020-11-11 EP disclosed
CN-106848406-B Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery 三菱化学株式会社 2020-09-11 CN disclosed
US-5643932-A PREVENTS CELL DAMAGE AFTER ISCHEMIA AND RE-PERFUSION, SUBSTITUTED THIAZOLES OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1997-07-01 US disclosed
US-5597776-A ANTAGONIST FOR HERBICIDES BASF AKTIENGESELLSCHAFT (DE) 1997-01-28 US disclosed
WO-1996037471-A1 N-AMINOPYRIDONE DERIVATIVES AND THEIR USE AS HERBICIDES BASF AKTIENGESELLSCHAFT (DE) 1996-11-28 WO disclosed
EP-0486937-B1 Hydrazone derivatives, processes for production thereof, and uses thereof NIHON NOHYAKU CO LTD (JP) 1995-03-22 EP disclosed
US-5358965-A Agricultural and horticultural insecticides, activity against moths and beetles NIHON NOHYAKU CO., LTD. (JP) 1994-10-25 US disclosed
US-5304573-A Insecticides NIHON NOHYAKU CO., LTD. (JP) 1994-04-19 US disclosed
EP-0537463-A2 Substituted pyrido(2,3-d)pyrimidines as antidotes BASF Aktiengesellschaft (DE) 1993-04-21 EP disclosed
EP-0513387-A1 ACTIVE OXYGEN INHIBITOR OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1992-11-19 EP disclosed
EP-0486937-A1 Hydrazone derivatives, processes for production thereof, and uses thereof NIHON NOHYAKU CO., LTD. (JP) 1992-05-27 EP disclosed
US-5039576-A From bath having alkyl sulfonic acid electrolyte, low melting ATOCHEM NORTH AMERICA, INC. (US) 1991-08-13 US disclosed