SCHEMBL7793172

SCHEMBL7793172

C=C(C)C(=O)OC1CC(C)CCC1C(C)(C)OC(=O)C=C(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7793170 1.00
SCHEMBL7794027 0.80 TLR4 (0.32)
SCHEMBL7794025 0.76 ALDH1A1 (0.30)
SCHEMBL8775683 0.70 ALDH1A1 (0.35)
SCHEMBL23576343 0.67 ALDH1A1 (0.33)
SCHEMBL23576342 0.67 ALDH1A1 (0.33)
SCHEMBL15247646 0.66 CHRM2 (0.37)
SCHEMBL465418 0.66 ALDH1A1 (0.34)
SCHEMBL14602591 0.66 CHRM2 (0.37)
SCHEMBL14420125 0.66 CHRM2 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0875496-B1 Acrylic or methacrylic acid derivatives and polymers obtained therefrom WAKO PURE CHEM IND LTD (JP) 2001-11-07 EP disclosed
US-5856521-A Acrylic or methacrylic acid derivatives and polymers obtained therefrom WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1999-01-05 US disclosed
EP-0875789-A1 Resist composition and its use for forming pattern WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1998-11-04 EP disclosed
EP-0875496-A1 Acrylic or methacrylic acid derivatives and polymers obtained therefrom WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1998-11-04 EP disclosed