SCHEMBL7793715

SCHEMBL7793715

C=C(C)C(=O)OCC(O)COC(=O)c1cc(I)cc(I)c1I

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.40
HDAC3 O15379 1/20 0.32
HDAC4 P56524 1/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC7 Q8WUI4 1/20 0.32
HDAC2 Q92769 1/20 0.32
HDAC10 Q969S8 1/20 0.32
HDAC11 Q96DB2 1/20 0.32
HDAC8 Q9BY41 1/20 0.32
HDAC6 Q9UBN7 1/20 0.32
HDAC9 Q9UKV0 1/20 0.32
HDAC5 Q9UQL6 1/20 0.32
ADRB2 P07550 9/20 0.32
ADRB1 P08588 9/20 0.32
ADRB3 P13945 9/20 0.32
ALDH1A1 P00352 1/20 0.31
POLB P06746 1/20 0.30
NLRP3 Q96P20 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8666347 0.88 TSHR (0.38) TSHRHDAC3HDAC4HDAC1HDAC7
SCHEMBL8654022 0.88 TSHR (0.38) TSHRHDAC3HDAC4HDAC1HDAC7
SCHEMBL22193457 0.86 TSHR (0.33) TSHRHDAC3HDAC4HDAC1HDAC7
SCHEMBL23601640 0.85 TSHR (0.42) TSHRADRB2ADRB1ADRB3
SCHEMBL6886176 0.84 THRB (0.41) TSHRHDAC3HDAC4HDAC1HDAC7
SCHEMBL29623140 0.84 THRB (0.41) TSHRHDAC3HDAC4HDAC1HDAC7
SCHEMBL22193459 0.84 TSHR (0.39) TSHRHDAC3HDAC4HDAC1HDAC7
SCHEMBL7792822 0.84 TSHR (0.45) TSHRHDAC3HDAC4HDAC1HDAC7
SCHEMBL23601573 0.82 HDAC3 (0.31) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL23573049 0.82 TSHR (0.40) TSHRALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113126432-B For photoresists primer coating composition 罗门哈斯电子材料韩国有限公司 2024-08-23 CN disclosed
CN-113126432-A Coating composition for photoresist underlayer 罗门哈斯电子材料韩国有限公司 2021-07-16 CN disclosed
US-20210200093-A1 COATING COMPOSITION FOR PHOTORESIST UNDERLAYER DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2021-07-01 US disclosed
US-20210200093-A1 COATING COMPOSITION FOR PHOTORESIST UNDERLAYER DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2021-07-01 US disclosed
EP-0710475-B1 High refractive index and/or radio-opaque resins systems ABONETICS LTD (GB) 2001-11-21 EP disclosed
EP-0684222-B1 Novel (meth)acrylate monomers and denture base compositions prepared therefrom ABONETICS LTD (GB) 1998-10-14 EP disclosed
US-5679710-A DENTAL COMPOSITES LONDON HOSPITAL MEDICAL COLLEGE (GB) 1997-10-21 US disclosed
EP-0710475-A1 High refractive index and/or radio-opaque resins systems THE LONDON HOSPITAL MEDICAL COLLEGE (GB) 1996-05-08 EP disclosed
EP-0684222-A1 Novel (meth)acrylate monomers and denture base compositions prepared therefrom THE LONDON HOSPITAL MEDICAL COLLEGE (GB) 1995-11-29 EP disclosed