SCHEMBL779460

SCHEMBL779460

C=C(C(=O)OC(=O)C(=C)C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4454832 0.90
SCHEMBL17240322 0.89
SCHEMBL17245069 0.88 ALDH1A1 (0.42)
SCHEMBL384728 0.83
SCHEMBL8893283 0.82
SCHEMBL779461 0.81 ALDH1A1 (0.32)
SCHEMBL779791 0.81
SCHEMBL21791959 0.78
SCHEMBL219777 0.78 ALDH1A1 (0.48)
SCHEMBL29279605 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 283 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2466379-B1 Resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-07-17 EP claimed
US-20100266954-A1 ADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME, AND CURING COMPOSITION CONTAINING ADAMANTANE DERIVATIVE IDEMITSU KOSAN CO., LTD. (JP) 2010-10-21 US claimed
US-12620622-B2 Compound including sulfur-containing heterocyclic cation and bis(oxolato)borate anion, electrolytic solution and electrochemical device including the same DAIKIN INDUSTRIES, LTD. (JP) 2026-05-05 US disclosed
EP-4711518-A1 COATED FIBERS AND MOLDED BODY USING SAME Kuraray Co., Ltd. (JP) 2026-03-18 EP disclosed
US-12460111-B2 Reinforcing fibers and production method therefor, and molded article using same KURARAY CO., LTD. (JP) 2025-11-04 US disclosed
US-20250260063-A1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, SECONDARY BATTERY, AND LITHIUM-ION SECONDARY BATTERY DAIKIN INDUSTRIES, LTD. (JP) 2025-08-14 US disclosed
EP-3780232-B1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY BATTERY, AND MODULE DAIKIN IND LTD (JP) 2025-07-30 EP disclosed
CN-120077502-A Electrolyte, electrochemical device, secondary battery, and lithium ion secondary battery 大金工业株式会社 2025-05-30 CN disclosed
US-20250174720-A1 ELECTROLYTE, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY, AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2025-05-29 US disclosed
US-12315885-B2 Electrolytic solution, electrochemical device, lithium-ion secondary battery, and module DAIKIN INDUSTRIES, LTD. (JP) 2025-05-27 US disclosed
EP-4553940-A1 SECONDARY BATTERY DAIKIN INDUSTRIES, LTD. (JP) 2025-05-14 EP disclosed
US-7202318-B2 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-04-10 US disclosed
US-7122292-B2 Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same CENTRAL GLASS COMPANY, LIMITED (JP) 2006-10-17 US disclosed
US-7078562-B2 Adamantane derivatives and resin compositions using the same as raw material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-07-18 US disclosed
US-20060094817-A1 Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2006-05-04 US disclosed
EP-1652846-A1 Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-05-03 EP disclosed
US-20060057489-A1 Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same CENTRAL GLASS COMPANY, LIMITED (JP) 2006-03-16 US disclosed
EP-1616854-A1 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-01-18 EP disclosed
US-20060009602-A1 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2006-01-12 US disclosed
US-20050158662-A1 Adamantane derivatives and resin compositions using the same as raw material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-07-21 US disclosed