⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27569731 | 0.83 | — | — | |
| SCHEMBL779460 | 0.81 | — | — | |
| SCHEMBL17240322 | 0.77 | — | — | |
| SCHEMBL17245069 | 0.76 | ALDH1A1 (0.42) | — | |
| SCHEMBL493095 | 0.75 | ALDH1A1 (0.46) | — | |
| SCHEMBL20867951 | 0.74 | ELANE (0.33) | — | |
| SCHEMBL4454832 | 0.73 | — | — | |
| SCHEMBL196496 | 0.73 | DGAT1 (0.33) | — | |
| SCHEMBL219777 | 0.72 | ALDH1A1 (0.48) | — | |
| SCHEMBL4378624 | 0.72 | ELANE (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2103592-B1 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-06-03 | — | — | EP | disclosed |
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8546587-B2 | Method for producing acrylate derivative, acrylate derivative, and intermediate thereof | KURARAY CO., LTD. (JP) | 2013-10-01 | — | — | US | disclosed |
| US-8431722-B2 | Acrylate ester derivatives and polymer compounds | KURARAY CO., LTD. (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8362169-B2 | Acrylate ester derivatives and polymer compounds | KURARAY CO., LTD. (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20130005990-A1 | METHOD FOR PRODUCING ACRYLATE DERIVATIVE, ACRYLATE DERIVATIVE, AND INTERMEDIATE THEREOF | KURARAY CO., LTD. (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20120316349-A1 | ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS | KURARAY CO., LTD. (JP) | 2012-12-13 | — | — | US | disclosed |
| US-8314258-B2 | Method for producing acrylate derivative, acrylate derivative, and intermediate thereof | KURARAY CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| US-8188299-B2 | Acrylate derivatives, alcohol derivatives, and method for producing them | KURARAY CO., LTD. (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20120071667-A1 | ACRYLATE DERIVATIVES, ALCOHOL DERIVATIVES, AND METHOD FOR PRODUCING THEM | KURARAY CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-8053165-B2 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-08 | — | — | US | disclosed |
| US-20110060112-A1 | ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS | KURARAY CO., LTD. (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110009643-A1 | METHOD FOR PRODUCING ACRYLATE DERIVATIVE, ACRYLATE DERIVATIVE, AND INTERMEDIATE THEREOF | KURARAY CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20090239179-A1 | HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-24 | — | — | US | disclosed |
| EP-2103592-A2 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-23 | — | — | EP | disclosed |