SCHEMBL7799164

SCHEMBL7799164

Oc1ccc(C(O)c2ccccc2)c(C(O)c2ccccc2)c1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.40
MAPT P10636 1/20 0.40
CYP2C9 P11712 1/20 0.40
KMT2A Q03164 1/20 0.40
TYR P14679 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
HPGD P15428 1/20 0.35
ADRA2A P08913 1/20 0.34
ADRA2B P18089 1/20 0.34
ADRA2C P18825 1/20 0.34
ADRA1A P35348 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
ADRB2 P07550 1/20 0.34
ADRA1B P35368 1/20 0.34
KDM4E B2RXH2 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4062311 0.86 MEN1 (0.41) MEN1MAPTCYP2C9KMT2ATYR
SCHEMBL7805743 0.79 HKDC1 (0.40) MEN1MAPTCYP2C9KMT2ATYR
SCHEMBL4063846 0.78 MAPT (0.44) MEN1MAPTCYP2C9KMT2ASMN1; SMN2
SCHEMBL6578256 0.77 MEN1 (0.50) MEN1MAPTCYP2C9KMT2ASMN1; SMN2
SCHEMBL11216546 0.76 MEN1 (0.39) MEN1MAPTCYP2C9KMT2ATYR
SCHEMBL27915198 0.74 IDO1 (0.52) MEN1MAPTCYP2C9KMT2ATYR
SCHEMBL29405346 0.73 MAPT (0.50) MEN1MAPTCYP2C9KMT2ASMN1; SMN2
SCHEMBL984999 0.73 MAPT (0.50) MEN1MAPTCYP2C9KMT2ASMN1; SMN2
SCHEMBL7809671 0.71 MEN1 (0.63) MEN1MAPTCYP2C9KMT2ASMN1; SMN2
SCHEMBL17703180 0.71 TYR (0.65) MEN1MAPTCYP2C9KMT2ATYR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed