Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.66 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.62 |
| ▸ | NPC1 | O15118 | 7/20 | 0.56 |
| ▸ | MAPT | P10636 | 7/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.56 |
| ▸ | RAB9A | P51151 | 5/20 | 0.56 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.55 |
| ▸ | MEN1 | O00255 | 3/20 | 0.55 |
| ▸ | HTT | P42858 | 1/20 | 0.55 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.55 |
| ▸ | GAA | P10253 | 2/20 | 0.51 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.51 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.51 |
| ▸ | RELA | Q04206 | 1/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.49 |
| ▸ | TP53 | P04637 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL439393 | 0.89 | RXFP1 (0.74) | TDP1RXFP1NPC1MAPTSMN1; SMN2 | |
| SCHEMBL17299114 | 0.88 | RXFP1 (0.62) | TDP1RXFP1NPC1MAPTSMN1; SMN2 | |
| SCHEMBL345555 | 0.86 | RXFP1 (0.61) | TDP1RXFP1NPC1MAPTSMN1; SMN2 | |
| SCHEMBL24799884 | 0.85 | RXFP1 (0.59) | TDP1RXFP1NPC1MAPTSMN1; SMN2 | |
| SCHEMBL16866619 | 0.85 | RXFP1 (0.59) | TDP1RXFP1NPC1MAPTSMN1; SMN2 | |
| SCHEMBL17084525 | 0.83 | RXFP1 (0.67) | TDP1RXFP1NPC1MAPTSMN1; SMN2 | |
| SCHEMBL529066 | 0.83 | MEN1 (0.61) | TDP1RXFP1NPC1MAPTSMN1; SMN2 | |
| SCHEMBL13921976 | 0.82 | KMT2A (0.52) | TDP1RXFP1MAPTKMT2AMEN1 | |
| SCHEMBL2135316 | 0.82 | F2 (0.73) | TDP1RXFP1 | |
| SCHEMBL13756133 | 0.82 | RXFP1 (0.56) | TDP1RXFP1NPC1MAPTSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114099705-B | Nanometer medicine based on hydralazine for improving tumor microenvironment and preparation and application thereof | 浙江大学杭州国际科创中心 | 2023-06-13 | — | — | CN | claimed |
| CN-114177137-B | Immunity activation based guanylated nano-drug and preparation and application thereof | 浙江大学杭州国际科创中心 | 2023-04-14 | — | — | CN | claimed |
| CN-114177137-A | Immunity activation based guanylated nano-drug and preparation and application thereof | 浙江大学杭州国际科创中心 | 2022-03-15 | — | — | CN | claimed |
| CN-114099705-A | Hydralazine-based nano-drug for improving tumor microenvironment, and preparation and application thereof | 浙江大学杭州国际科创中心 | 2022-03-01 | — | — | CN | claimed |
| CN-114099705-B | Nanometer medicine based on hydralazine for improving tumor microenvironment and preparation and application thereof | 浙江大学杭州国际科创中心 | 2023-06-13 | — | — | CN | disclosed |
| CN-114177137-B | Immunity activation based guanylated nano-drug and preparation and application thereof | 浙江大学杭州国际科创中心 | 2023-04-14 | — | — | CN | disclosed |
| CN-114177137-A | Immunity activation based guanylated nano-drug and preparation and application thereof | 浙江大学杭州国际科创中心 | 2022-03-15 | — | — | CN | disclosed |
| CN-114099705-A | Hydralazine-based nano-drug for improving tumor microenvironment, and preparation and application thereof | 浙江大学杭州国际科创中心 | 2022-03-01 | — | — | CN | disclosed |
| EP-0823661-B1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO LTD (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-6248500-B1 | ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |