⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10455458 | 0.92 | — | — | |
| SCHEMBL782172 | 0.76 | — | — | |
| SCHEMBL3374502 | 0.76 | — | — | |
| SCHEMBL3378253 | 0.74 | CHRM1 (0.32) | — | |
| SCHEMBL3378705 | 0.73 | — | — | |
| Oxalic Acid SCHEMBL30392002 | 0.71 | SLC7A5 (0.31) | — | |
| SCHEMBL3379280 | 0.71 | ALDH1A1 (0.38) | — | |
| SCHEMBL17420847 | 0.71 | — | — | |
| SCHEMBL865424 | 0.71 | — | — | |
| SCHEMBL31537157 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8298743-B2 | Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery | FUJIFILM CORPORATION (JP) | 2012-10-30 | — | — | US | claimed |
| US-12443101-B2 | Cured coating film | TAIYO HOLDINGS CO., LTD. (JP) | 2025-10-14 | — | — | US | disclosed |
| US-12313973-B2 | Insulating layer for multilayer printed circuit board, multilayer printed circuit board comprising same, and method for producing same | LG CHEM, LTD. (KR) | 2025-05-27 | — | — | US | disclosed |
| EP-4502077-A1 | CURED PRODUCT, PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, AND PRINTED WIRING BOARD | TAIYO HOLDINGS CO., LTD. (JP) | 2025-02-05 | — | — | EP | disclosed |
| US-12043754-B2 | Two-component type curable resin composition, product, dry film, cured product, and printed wiring board | TAIYO HOLDINGS CO., LTD. (JP) | 2024-07-23 | — | — | US | disclosed |
| EP-3569662-B1 | ANTIMICROBIAL POLYMER COATING COMPOSITION AND ANTIMICROBIAL POLYMER FILM | LG CHEMICAL LTD (KR) | 2022-12-28 | — | — | EP | disclosed |
| US-20220390844-A1 | CURED COATING FILM | TAIYO INK MFG. CO., LTD. (JP) | 2022-12-08 | — | — | US | disclosed |
| US-20220325126-A1 | INSULATING FILM FOR ELECTRONIC COMPONENTS AND METHOD OF PRODUCING INSULATING FILM FOR ELECTRONIC COMPONENTS | TAIYO INK MFG. CO., LTD. (JP) | 2022-10-13 | — | — | US | disclosed |
| US-20220325128-A1 | TWO-COMPONENT TYPE CURABLE RESIN COMPOSITION, PRODUCT, DRY FILM, CURED PRODUCT, AND PRINTED WIRING BOARD | TAIYO INK MFG. CO., LTD. (JP) | 2022-10-13 | — | — | US | disclosed |
| US-20220279663-A1 | INSULATING LAYER FOR MULTILAYER PRINTED CIRCUIT BOARD, MULTILAYER PRINTED CIRCUIT BOARD COMPRISING SAME, AND METHOD FOR PRODUCING SAME | LG CHEM, LTD. (KR) | 2022-09-01 | — | — | US | disclosed |
| US-7670745-B2 | Alkali soluble polymer and positive working photosensitive resin composition using the same | CHISSO CORPORATION (JP) | 2010-03-02 | — | — | US | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-7585570-B2 | A curable adhesive comprising acrylic ester polymers, a polysilsesquioxane or polysilicate, and a disisocyanate crosslinking agent; liquid crystal displays; glass substrates; films; durability; antipeeling agents; haze-free, nonblistering; antifoam agents; resistant to repeated cycles of heating/cooling | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-08 | — | — | US | disclosed |
| US-20080131813-A1 | Alkali soluble polymer and positive working photosensitive resin composition using the same | CHISSO CORPORATION | 2008-06-05 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| US-20060252863-A1 | A curable adhesive comprising acrylic ester polymers, a polysilsesquioxane or polysilicate, and a disisocyanate crosslinking agent; liquid crystal displays; glass substrates; films; durability; antipeeling agents; haze-free, nonblistering; antifoam agents; resistant to repeated cycles of heating/cooling | SUMITOMO CHEMICHAL COMPANY, LIMITED | 2006-11-09 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| WO-2006004171-A1 | PHOTOSENSITIVE FILM, PROCESS FOR PRODUCING THE SAME, PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2006-01-12 | — | — | WO | disclosed |
| WO-2005093793-A1 | PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |