⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18297873 | 0.93 | — | — | |
| SCHEMBL3378705 | 0.86 | — | — | |
| SCHEMBL17420847 | 0.83 | — | — | |
| SCHEMBL17420842 | 0.81 | ACE2 (0.32) | — | |
| SCHEMBL3375042 | 0.81 | — | — | |
| SCHEMBL3375653 | 0.79 | CHRM1 (0.31) | — | |
| SCHEMBL3379257 | 0.77 | HPGD (0.36) | — | |
| SCHEMBL780494 | 0.76 | — | — | |
| SCHEMBL3375619 | 0.71 | CHRM1 (0.31) | — | |
| SCHEMBL3378008 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080103280-A1 | Ink-jet ink and cured film obtained from same | CHISSO CORPORATION | 2008-05-01 | — | — | US | claimed |
| US-12443101-B2 | Cured coating film | TAIYO HOLDINGS CO., LTD. (JP) | 2025-10-14 | — | — | US | disclosed |
| US-12337286-B2 | Composite semipermeable membrane | NITTO DENKO CORPORATION (JP) | 2025-06-24 | — | — | US | disclosed |
| US-12313973-B2 | Insulating layer for multilayer printed circuit board, multilayer printed circuit board comprising same, and method for producing same | LG CHEM, LTD. (KR) | 2025-05-27 | — | — | US | disclosed |
| EP-4502077-A1 | CURED PRODUCT, PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, AND PRINTED WIRING BOARD | TAIYO HOLDINGS CO., LTD. (JP) | 2025-02-05 | — | — | EP | disclosed |
| US-12043754-B2 | Two-component type curable resin composition, product, dry film, cured product, and printed wiring board | TAIYO HOLDINGS CO., LTD. (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12018107-B2 | Polymer material, composition, and method of manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2024-06-25 | — | — | US | disclosed |
| US-11958986-B2 | Antibacterial polymer coating composition and antibacterial polymer film | LG CHEM, LTD. (KR) | 2024-04-16 | — | — | US | disclosed |
| WO-2024034464-A1 | ADHESIVE FILM FOR CIRCUIT CONNECTION, CIRCUIT CONNECTION STRUCTURE, AND MANUFACTURING METHOD THEREFOR | 株式会社レゾナック | 2024-02-15 | — | — | WO | disclosed |
| WO-2024010060-A1 | CONDUCTIVE PASTE, RFID INLAY, METHOD FOR PRODUCING RFID INLAY, USE OF CONDUCTIVE PASTE FOR PURPOSE OF BONDING CHIP, AND USE OF CONDUCTIVE PASTE FOR PURPOSE OF OBTAINING RFID INLAY | 積水化学工業株式会社 | 2024-01-11 | — | — | WO | disclosed |
| US-20080085361-A1 | Inkjet ink | CHISSO CORPORATION | 2008-04-10 | — | — | US | disclosed |
| US-20080003381-A1 | Overcoat film composition, color filter substrate, and liquid crystal display element | CHISSO CORPORATION | 2008-01-03 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| WO-2007017287-A1 | COLD-BOX BINDER USING OXETANES | Ashland-Südchemie-Kernfest GmbH (DE) | 2007-02-15 | — | — | WO | disclosed |
| US-20060252863-A1 | A curable adhesive comprising acrylic ester polymers, a polysilsesquioxane or polysilicate, and a disisocyanate crosslinking agent; liquid crystal displays; glass substrates; films; durability; antipeeling agents; haze-free, nonblistering; antifoam agents; resistant to repeated cycles of heating/cooling | SUMITOMO CHEMICHAL COMPANY, LIMITED | 2006-11-09 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| WO-2006004171-A1 | PHOTOSENSITIVE FILM, PROCESS FOR PRODUCING THE SAME, PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2006-01-12 | — | — | WO | disclosed |
| WO-2005093793-A1 | PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| WO-2002036660-A1 | NOVEL BRANCHED OXETANE POLYESTER | PERSTORP SPECIALTY CHEMICALS AB (SE) | 2002-05-10 | — | — | WO | disclosed |