SCHEMBL7806575

SCHEMBL7806575

Nc1ccccc1C(c1ccccc1)(c1ccccc1N)c1ccccc1N

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 2/20 0.43
CYP3A4 P08684 1/20 0.43
CASP1 P29466 1/20 0.43
CASP7 P55210 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
KCNN4 O15554 4/20 0.42
ALDH1A1 P00352 3/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
HSD17B10 Q99714 1/20 0.37
TSHR P16473 5/20 0.36
KIF11 P52732 1/20 0.35
TAAR1 Q96RJ0 1/20 0.34
MEN1 O00255 1/20 0.33
MAPT P10636 1/20 0.33
KMT2A Q03164 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
APOBEC3G Q9HC16 1/20 0.33
NPC1 O15118 1/20 0.33
GAA P10253 1/20 0.33
RAB9A P51151 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11043875 0.95 ALOX15 (0.43) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL2202783 0.84 CYP3A4 (0.53) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL28176613 0.83 CYP3A4 (0.45) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL2356320 0.80 KCNN4 (0.48) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL10784751 0.79 CD44 (0.38) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL572998 0.78 KCNN4 (0.59) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL30940020 0.78 ALOX15 (0.41) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL5409173 0.76 CYP3A4 (0.39) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL3751989 0.76 CYP3A4 (0.45) ALOX15CYP3A4CASP1CASP7SMN1; SMN2
SCHEMBL3225202 0.76 ESR1 (0.45) ALOX15CYP3A4CASP1CASP7SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed