SCHEMBL780743

SCHEMBL780743

CC(C)(C)C(O[SiH3])(c1ccccc1)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.46
ALDH1A1 P00352 3/20 0.43
ALOX15 P16050 1/20 0.43
TAAR1 Q96RJ0 1/20 0.38
ESR1 P03372 2/20 0.37
ESR2 Q92731 2/20 0.37
CYP3A4 P08684 1/20 0.37
KCNN4 O15554 4/20 0.36
MAPT P10636 1/20 0.35
KMT2A Q03164 1/20 0.35
TSHR P16473 2/20 0.35
CYP2C19 P33261 1/20 0.34
HIF1A Q16665 1/20 0.34
CYP2B6 P20813 1/20 0.33
HDAC3 O15379 1/20 0.33
HDAC4 P56524 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC7 Q8WUI4 1/20 0.33
HDAC2 Q92769 1/20 0.33
HDAC10 Q969S8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6686371 0.80 MAPK1 (0.50) MAPK1ALDH1A1ALOX15TAAR1ESR1
SCHEMBL11724138 0.80 MAPK1 (0.56) MAPK1ALDH1A1ALOX15TAAR1ESR1
SCHEMBL702694 0.76 MAPK1 (0.46) MAPK1ALDH1A1ALOX15TAAR1ESR1
SCHEMBL1313824 0.76 MAPK1 (0.46) MAPK1ALDH1A1ALOX15TAAR1ESR1
SCHEMBL48954 0.75 MAPK1 (0.64) MAPK1ALDH1A1ALOX15TAAR1ESR1
SCHEMBL675685 0.75 MAPK1 (0.50) MAPK1ALDH1A1ALOX15TAAR1ESR1
SCHEMBL982542 0.74 ALDH1A1 (0.37) MAPK1ALDH1A1ALOX15ESR1ESR2
SCHEMBL24797238 0.73 MAPK1 (0.43) MAPK1ALDH1A1ALOX15TAAR1ESR1
SCHEMBL705720 0.73 MAPK1 (0.43) MAPK1ALDH1A1ALOX15TAAR1ESR1
SCHEMBL705273 0.71 MAPK1 (0.46) MAPK1ALDH1A1ALOX15TAAR1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116120777-A Preparation method of modified silica sol for water-based ink 山东科翰硅源新材料有限公司 2023-05-16 CN claimed
CN-111883748-A Method for coating oxide film on surface of lithium ion battery anode powder material 华南理工大学 2020-11-03 CN claimed
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
US-7405168-B2 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMITED (JP) 2008-07-29 US claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
US-6703497-B1 SURFACE MODIFIED BY HAVING HYDROXYL FUNCTIONAL GROUPS PRESENT AT THE SURFACE ETHERIFIED BY ORGANIC COMPOUND COMPRISING SILYLATING AGENT, ISOCYANATE, HALOGENATED ALKYLATING AGENT, ALKYLENE OXIDE, OR GLYCIDYL COMPOUND RHODIA CHIMIE (FR) 2004-03-09 US claimed
WO-2000050478-A1 NOVEL FORMULATIONS OF ALKYLLITHIUMS WITH IMPROVED THERMAL STABILITY, PROCESSES TO PRODUCE THESE FORMULATIONS AND PROCESSES FOR USING THE SAME TO IMPROVE STABILITY OF LIVING POLYMER CHAIN ENDS FMC CORPORATION (US) 2000-08-31 WO claimed
US-20260118791-A1 TONER CANON KK (JP) 2026-04-30 US disclosed
EP-4590737-B1 COMPOSITION AND ARTICLE INCLUDING A THERMOPLASTIC AND A BRANCHED SILSESQUIOXANE POLYMER AND RELATED PROCESS 3M INNOVATIVE PROPERTIES COMPANY (US) 2026-04-29 EP disclosed
WO-1990005730-A2 NOVEL CYCLOBUTANE DERIVATIVE AND PROCESS FOR PRODUCING SAME NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1990-05-31 WO disclosed
EP-0358154-A2 Novel cyclobutane derivative and process for producing same NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1990-03-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118791-A1 TONER MSR1, H1-2, TAAR1 MAPK1 3375/4885ALDH1A1 2569/4885ALOX15 1652/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.