SCHEMBL780744

SCHEMBL780744

CC(C)(C)[SiH2]OC(c1ccccc1)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SCN1A P35498 3/20 0.37
SCN2A Q99250 3/20 0.37
SCN3A Q9NY46 3/20 0.37
LMNA P02545 2/20 0.37
CHRM2 P08172 2/20 0.37
ADRA2A P08913 2/20 0.37
CYP2D6 P10635 2/20 0.37
CHRM1 P11229 2/20 0.37
SLC6A2 P23975 2/20 0.37
ADRA1A P35348 2/20 0.37
OPRM1 P35372 2/20 0.37
DRD3 P35462 2/20 0.37
HTT P42858 2/20 0.37
SLC6A3 Q01959 2/20 0.37
KCNH2 Q12809 2/20 0.37
CYP1A2 P05177 1/20 0.37
CHRM4 P08173 1/20 0.37
CHRM5 P08912 1/20 0.37
TSHR P16473 1/20 0.37
ADRA2B P18089 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4122749 0.75 SCN1A (0.41) SCN1ASCN2ASCN3ALMNACHRM2
SCHEMBL23910518 0.74 SIGMAR1 (0.39) SCN1ASCN2ASCN3ACYP2D6SLC6A2
SCHEMBL5328914 0.71 APP (0.34) LMNACHRM2CHRM1ADRA1ASLC6A3
SCHEMBL1315134 0.71 SCN1A (0.38) SCN1ASCN2ASCN3ALMNACHRM2
SCHEMBL1313616 0.71 HRH1 (0.39) LMNACHRM2CHRM1SLC6A2ADRA1A
SCHEMBL23032124 0.70 HTT (0.41) SCN1ASCN2ASCN3ALMNACHRM2
SCHEMBL10438594 0.70 IDO1 (0.42) SCN1ASCN2ASCN3ALMNACHRM2
SCHEMBL10438591 0.70 IDO1 (0.39) SCN1ASCN2ASCN3ALMNACHRM2
SCHEMBL3889071 0.70 IDO1 (0.43) HTR2AIDO1TDO2
SCHEMBL705044 0.70 IDO1 (0.39) SCN1ASCN2ASCN3ALMNACHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116120777-A Preparation method of modified silica sol for water-based ink 山东科翰硅源新材料有限公司 2023-05-16 CN claimed
CN-111883748-A Method for coating oxide film on surface of lithium ion battery anode powder material 华南理工大学 2020-11-03 CN claimed
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
US-7405168-B2 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMITED (JP) 2008-07-29 US claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
US-6703497-B1 SURFACE MODIFIED BY HAVING HYDROXYL FUNCTIONAL GROUPS PRESENT AT THE SURFACE ETHERIFIED BY ORGANIC COMPOUND COMPRISING SILYLATING AGENT, ISOCYANATE, HALOGENATED ALKYLATING AGENT, ALKYLENE OXIDE, OR GLYCIDYL COMPOUND RHODIA CHIMIE (FR) 2004-03-09 US claimed
WO-2000050478-A1 NOVEL FORMULATIONS OF ALKYLLITHIUMS WITH IMPROVED THERMAL STABILITY, PROCESSES TO PRODUCE THESE FORMULATIONS AND PROCESSES FOR USING THE SAME TO IMPROVE STABILITY OF LIVING POLYMER CHAIN ENDS FMC CORPORATION (US) 2000-08-31 WO claimed
US-20260118791-A1 TONER CANON KK (JP) 2026-04-30 US disclosed
EP-4590737-B1 COMPOSITION AND ARTICLE INCLUDING A THERMOPLASTIC AND A BRANCHED SILSESQUIOXANE POLYMER AND RELATED PROCESS 3M INNOVATIVE PROPERTIES COMPANY (US) 2026-04-29 EP disclosed
US-5498481-A Metal substrate with enhanced corrosion resistance and improved paint adhesion ARMCO INC. (US) 1996-03-12 US disclosed
US-5455080-A Metal substrate with enhanced corrosion resistance and improved paint adhesion ARMCO INC. (US) 1995-10-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118791-A1 TONER MSR1, H1-2, TAAR1 SCN1A 2980/4885SCN2A 3237/4885SCN3A 4139/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.