SCHEMBL781430

SCHEMBL781430

C=C(C(=O)Br)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29026402 0.75
SCHEMBL973725 0.73 CA2 (0.33)
SCHEMBL9455389 0.71
SCHEMBL203037 0.71
SCHEMBL2776908 0.71
SCHEMBL1930049 0.71
SCHEMBL864818 0.71
SCHEMBL21150959 0.71
SCHEMBL28155409 0.69
Ammonia Solution, Strong SCHEMBL25206010 0.69 TET2 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112585113-B Process for distillative purification of fluorine-containing polymerizable monomers 中央硝子株式会社 2023-08-22 CN disclosed
CN-112585113-A Method for purifying fluorine-containing polymerizable monomer by distillation 中央硝子株式会社 2021-03-30 CN disclosed
US-9513545-B2 Homoadamantane derivatives, process for preparing same, and photoresist compositions OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) 2016-12-06 US disclosed
US-20150316847-A1 HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) 2015-11-05 US disclosed
EP-2080774-B1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN JSR CORP (JP) 2014-01-15 EP disclosed
US-20130143157-A1 HOMOADAMANTANE DERIVATIVES, PROCESS FOR PREPARING SAME, AND PHOTORESIST COMPOSITIONS IDEMITSU KOSAN CO., LTD. (JP) 2013-06-06 US disclosed
US-20130022914-A1 HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST IDEMITSU KOSAN CO., LTD. (JP) 2013-01-24 US disclosed
US-8188299-B2 Acrylate derivatives, alcohol derivatives, and method for producing them KURARAY CO., LTD. (JP) 2012-05-29 US disclosed
US-20120071667-A1 ACRYLATE DERIVATIVES, ALCOHOL DERIVATIVES, AND METHOD FOR PRODUCING THEM KURARAY CO., LTD. (JP) 2012-03-22 US disclosed
US-7956142-B2 Polymerizable sulfonic acid onium salt and resin JSR CORPORATION (JP) 2011-06-07 US disclosed
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN JSR CORPORATION (JP) 2010-03-11 US disclosed
EP-2080774-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN JSR Corporation (JP) 2009-07-22 EP disclosed