⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL973725 | 0.76 | CA2 (0.33) | — | |
| SCHEMBL9455389 | 0.73 | — | — | |
| SCHEMBL1930049 | 0.73 | — | — | |
| SCHEMBL203037 | 0.73 | — | — | |
| SCHEMBL864818 | 0.73 | — | — | |
| Ammonia Solution, Strong SCHEMBL25206010 | 0.71 | TET2 (0.34) | — | |
| SCHEMBL8586407 | 0.71 | TET2 (0.34) | — | |
| Hydrochloric Acid SCHEMBL953095 | 0.71 | TET2 (0.34) | — | |
| SCHEMBL13044838 | 0.71 | — | — | |
| Potassium Ion SCHEMBL10723738 | 0.71 | CA4 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |