Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.64 |
| ▸ | RAB9A | P51151 | 3/20 | 0.64 |
| ▸ | LMNA | P02545 | 1/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | GAA | P10253 | 2/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 3/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.38 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29354646 | 1.00 | NPC1 (0.64) | NPC1RAB9ALMNAALDH1A1HPGD | |
| Drometrizole SCHEMBL10809817 | 0.93 | NPC1 (0.78) | NPC1RAB9ALMNAALDH1A1HPGD | |
| SCHEMBL7198524 | 0.89 | NPC1 (0.52) | NPC1RAB9ALMNAALDH1A1HPGD | |
| Octrizole SCHEMBL5547097 | 0.89 | NPC1 (0.52) | NPC1RAB9ALMNAALDH1A1HPGD | |
| SCHEMBL10544666 | 0.89 | NPC1 (0.62) | NPC1RAB9ALMNAALDH1A1HPGD | |
| SCHEMBL7190428 | 0.88 | NPC1 (0.60) | NPC1RAB9ALMNAALDH1A1HPGD | |
| SCHEMBL11306262 | 0.87 | NPC1 (0.51) | NPC1RAB9ALMNAALDH1A1HPGD | |
| SCHEMBL10674478 | 0.86 | NPC1 (0.49) | NPC1RAB9ALMNAALDH1A1HPGD | |
| SCHEMBL2744415 | 0.86 | NPC1 (0.59) | NPC1RAB9ALMNAALDH1A1HPGD | |
| SCHEMBL28218187 | 0.86 | NPC1 (0.49) | NPC1RAB9ALMNAALDH1A1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 9324 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146144-A1 | SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2026-05-28 | — | — | US | claimed |
| US-12552970-B2 | Adhesive sheet, construct, and method for producing construct | LINTEC CORPORATION (JP) | 2026-02-17 | — | — | US | claimed |
| EP-4605460-A1 | SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | Cytec Industries Inc. (US) | 2025-08-27 | — | — | EP | claimed |
| EP-4574893-A1 | BARIUM MAGNESIUM SILICATES AND 2-HYDROXYPHENYLBENZOTRIAZOLE UV ABSORBERS IN A GREENHOUSE FILM | RHODIA OPERATIONS (FR) | 2025-06-25 | — | — | EP | claimed |
| US-12339419-B2 | Anti-blue light resin lens with refractive index of 1.50 and preparation method thereof | Jiangsu Conant Optical Co., Ltd. (CN) | 2025-06-24 | — | — | US | claimed |
| CN-120092045-A | Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same | 塞特工业公司 | 2025-06-03 | — | — | CN | claimed |
| WO-2025099143-A1 | COMPOSITIONS FOR STABILIZING POLYMERIC MATERIALS AGAINST UV LIGHT THERMAL AND GAS FADING DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | claimed |
| WO-2025099141-A1 | STABILIZING COMPOSITIONS FOR POLYMERIC MATERIALS | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | claimed |
| EP-4532595-A1 | POLYCARBONATE COMPOSITION CONTAINING COMBINATION OF HYDROXYPHENYL TRIAZINES AND UV ABSORBERS | BASF SE (DE) | 2025-04-09 | — | — | EP | claimed |
| WO-2025056330-A1 | STABILIZED POLYMER COMPOSITIONS WITH IMPROVED COLOR RESISTANCE | CYTEC INDUSTRIES INC. (US) | 2025-03-20 | — | — | WO | claimed |
| US-5215858-A | PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMATION USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1993-06-01 | — | — | US | claimed |
| EP-0543393-A1 | Coating composition | MITSUBISHI RAYON CO., LTD (JP) | 1993-05-26 | — | — | EP | claimed |
| US-4937349-A | Process for the preparation of 3-[2'H-benzotriazol-(2')-yl]-4-hydroxy-benzenesulfonic acids and the salts thereof | CIBA-GEIGY CORPORATION (US) | 1990-06-26 | — | — | US | claimed |
| US-4935455-A | Blend containing mercaptoalkylpolysiloxane | TOSHIBA SILICONE CO., LTD. (JP) | 1990-06-19 | — | — | US | claimed |
| EP-0334233-A2 | Photosensitive resin composition and pattern formation using the same | Hitachi Chemical Co., Ltd. (JP) | 1989-09-27 | — | — | EP | claimed |
| EP-0314620-A1 | Process for the preparation of 3-[2'H-benzotriazol-(2')-yl]-4-hydroxy benzene sulfonic acids and their salts | CIBA-GEIGY AG (CH) | 1989-05-03 | — | — | EP | claimed |
| US-4467061-A | POLYOLEFIN BLENDS WITH BENZOTRIAZOLE COMPOUND, HINDERED AMINE, PHENYL BENZOATE OR NICKEL COMPLEX | TONEN SEKIYU KAGAKU KABUSHIKI KAISHA (JP) | 1984-08-21 | — | — | US | claimed |
| US-4396644-A | ACRYLIC ESTERS, OVERCOATING | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1983-08-02 | — | — | US | claimed |
| US-4297428-A | USING A DIAZONIUM SALT AND A COUPLER, AND AN ULTRAVIOLET ABSORBER COMPRISING A BENZOTRIAZOLE DERIVATIVE | YAMAMOTO KANEO | 1981-10-27 | — | — | US | claimed |
| US-4173561-A | STYRENE RESIN, HALOGEN COMPOUND, INORGANIC HYDRATE, MAGNESIUM COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1979-11-06 | — | — | US | claimed |