SCHEMBL781927

SCHEMBL781927

CC(C)(C)OOC(C)(C)c1ccc(C(=O)c2ccccc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.53
ALDH1A1 P00352 3/20 0.51
TDP1 Q9NUW8 3/20 0.51
TSHR P16473 1/20 0.51
HSD17B10 Q99714 1/20 0.51
ELANE P08246 7/20 0.50
SRD5A2 P31213 2/20 0.49
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
HPGD P15428 1/20 0.44
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
PPARA Q07869 1/20 0.43
L3MBTL1 Q9Y468 3/20 0.42
MAPT P10636 1/20 0.42
ATM Q13315 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9686148 0.93 MAPK1 (0.63) MAPK1ALDH1A1TDP1TSHRHSD17B10
SCHEMBL9351579 0.93 SRD5A2 (0.50) MAPK1ALDH1A1TDP1TSHRHSD17B10
SCHEMBL9351799 0.91 MAPK1 (0.65) MAPK1ALDH1A1TDP1TSHRHSD17B10
SCHEMBL9352515 0.85 TDP1 (0.52) MAPK1ALDH1A1TDP1TSHRHSD17B10
SCHEMBL9351571 0.85 ELANE (0.51) MAPK1TDP1TSHRELANESRD5A2
SCHEMBL9355808 0.85 KMT2A (0.50) MAPK1ELANESRD5A2RAB9AHPGD
SCHEMBL9355796 0.85 TDP1 (0.44) MAPK1ALDH1A1TDP1TSHRHSD17B10
SCHEMBL9351662 0.84 MAPK1 (0.47) MAPK1ALDH1A1ELANESRD5A2NPC1
SCHEMBL9351729 0.84 ELANE (0.49) MAPK1ALDH1A1TDP1ELANESRD5A2
SCHEMBL9355370 0.83 MAPK1 (0.46) MAPK1ALDH1A1ELANESRD5A2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116874659-A Low-temperature secondary photo-curing grafting oligomer and photosensitive resin composition containing same 深圳市安云鑫新材料科技有限公司 2023-10-13 CN claimed
JP-3052856-A None JP disclosed
US-12625443-B2 Toner seal member and toner cartridge INOAC CORPORATION (JP) 2026-05-12 US disclosed
US-20250377613-A1 MEMBER AND TONER CARTRIDGE INOAC CORPORATION (JP) 2025-12-11 US disclosed
US-20250370380-A1 TONER SEAL MEMBER AND TONER CARTRIDGE INOAC CORPORATION (JP) 2025-12-04 US disclosed
US-20250297048-A1 (METH)ACRYLATE-BASED RESIN, AND DRY FILM SOLDER RESIST COMPRISING SAME LG CHEM, LTD. (KR) 2025-09-25 US disclosed
WO-2025123893-A1 ELECTROPLATING-RESISTANT COMPOSITION AND DRY FILM PREPARED THEREFROM, CURED PRODUCT, AND ELECTRODE FOR SOLAR CELL 太阳油墨(苏州)有限公司 2025-06-19 WO disclosed
WO-2025126562-A1 PIGMENT DISPERSION COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT 株式会社レゾナック 2025-06-19 WO disclosed
CN-116490533-B Pigment dispersion composition and photosensitive coloring composition 株式会社力森诺科 2025-06-13 CN disclosed
WO-2025121033-A1 METHOD FOR PRODUCING COPOLYMER 株式会社レゾナック 2025-06-12 WO disclosed
EP-1275665-A1 RESINS CURABLE WITH ACTINIC RADIATION, PROCESS FOR THE PRODUCTION THEREOF, AND PHOTO- AND THERMO-SETTING RESIN COMPOSITION Kanagawa University (JP) 2003-01-15 EP disclosed
US-20030009053-A1 Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY (JP) 2003-01-09 US disclosed
EP-1251118-A1 UNSATURATED MONOCARBOXYLIC ESTER COMPOUND, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION CURABLE WITH ACTINIC ENERGY RAY Kanagawa University (JP) 2002-10-23 EP disclosed
US-6077879-A RADICALLY POLYMERIZABLE CURABLE RESIN OBTAINED BY REACTING POLYEPOXIDE WITH PHENOL COMPOUND HAVING ALCOHOLIC HYDROXYL GROUP AND UNSATURATED MONOBASIC ACID NIPPON SHOKUBAI CO., LTD. (JP) 2000-06-20 US disclosed
US-5849857-A Production method for photo-sensitive resin and liquid photo-sensitive resin composition NIPPON SHOKUBAI CO., LTD. (JP) 1998-12-15 US disclosed
EP-0728788-A1 PROCESS FOR PRODUCING PHOTOSENSITIVE RESIN AND LIQUID PHOTOSENSITIVE RESIN COMPOSITION NIPPON SHOKUBAI CO., LTD. (JP) 1996-08-28 EP disclosed
EP-0409520-B1 Novel dialkyl peroxides, production method and use thereof NIPPON OILS & FATS CO LTD (JP) 1994-09-14 EP disclosed
US-5091586-A Photolysis type or pyrolysis type forming agents NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1992-02-25 US disclosed
JP-H0352856-A DIALKYL PEROXIDE, PRODUCTION THEREOF AND USE OF SAME COMPOUND NIPPON OIL & FATS CO LTD 1991-03-07 JP disclosed
EP-0409520-A2 Novel dialkyl peroxides, production method and use thereof NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1991-01-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030009053-A1 Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray ACSL1, ACSL6, ACSL4 MAPK1 1297/4885ALDH1A1 585/4885TDP1 4391/4885
US-12625443-B2 Toner seal member and toner cartridge FTO, PUF60, UROD MAPK1 3733/4885ALDH1A1 3708/4885TDP1 509/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.