Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14010865 | 0.89 | ALDH1A1 (0.48) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL19056975 | 0.87 | ALDH1A1 (0.51) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL21401059 | 0.87 | ALDH1A1 (0.51) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL19185357 | 0.87 | ALDH1A1 (0.51) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL24832398 | 0.86 | ALDH1A1 (0.50) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL31150567 | 0.86 | ALDH1A1 (0.50) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL19261087 | 0.86 | ALDH1A1 (0.50) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL21279984 | 0.85 | MAPT (0.55) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL2160093 | 0.85 | MAPT (0.55) | ALDH1A1LMNAMAPTMAPK1KMT2A | |
| SCHEMBL28204329 | 0.85 | MAPT (0.55) | ALDH1A1LMNAMAPTMAPK1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 294 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11820930-B2 | Polymer compound, liquid crystal composition, phase difference layer, optical film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820930-B2 | Polymer compound, liquid crystal composition, phase difference layer, optical film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11807023-B2 | Pretreatment liquid, ink set, image recorded material, base material for image recording, method of producing base material for image recording, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| US-11807023-B2 | Pretreatment liquid, ink set, image recorded material, base material for image recording, method of producing base material for image recording, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| US-11795334-B2 | Photo-curable ink composition and method for forming image | FUJIFILM CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11762288-B2 | Resist composition, method of forming resist pattern, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11754922-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-20080171287-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-07-17 | — | — | US | disclosed |
| US-20080137206-A1 | Film, Manufacturing Method Thereof, Polarization Plate Using the Film, and Liquid Crystal, and Display Device Using the Polarizing Plate | FUJIFILM CORPORATION (JP) | 2008-06-12 | — | — | US | disclosed |
| US-20080081288-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080081290-A1 | RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080026324-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR PREPARATION OF LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2008-01-31 | — | — | US | disclosed |
| US-20070289497-A1 | Coating Composition, Optical Film, Anti-reflection Film, Polarizing Plate, and Display Unit Using Them | FUJIFILM CORPORATION (JP) | 2007-12-20 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070148595-A1 | Resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid, a photoacid generator, methacrylic resins having hydrolysable ester groups and solvent; profiles; pattern collapse; immersion exposure; ARF lasers | FUJIFILM CORPORATION (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070134588-A1 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | MRPS23, MRPS22, SLC11A2 | ALDH1A1 2173/4885LMNA 2768/4885MAPT 4792/4885 |
| US-20080081288-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION | PPOX, TYR, ERCC4 | ALDH1A1 1523/4885LMNA 3982/4885MAPT 1254/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.