Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 3/20 | 0.50 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.47 |
| ▸ | NAAA | Q02083 | 2/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2681050 | 0.98 | EPHX1 (0.47) | EPHX1CYP19A1NAAAHTTL3MBTL1 | |
| SCHEMBL1350834 | 0.94 | EPHX1 (0.43) | EPHX1CYP19A1NAAAHTTL3MBTL1 | |
| SCHEMBL10900145 | 0.90 | CHRM2 (0.38) | EPHX1CYP19A1NAAAL3MBTL1CYP2C19 | |
| SCHEMBL28331691 | 0.89 | EPHX1 (0.41) | EPHX1CYP19A1NAAAHTTL3MBTL1 | |
| SCHEMBL18253394 | 0.86 | CYP2C19 (0.44) | EPHX1CYP19A1NAAAHTTL3MBTL1 | |
| SCHEMBL4743509 | 0.85 | NAAA (0.47) | EPHX1CYP19A1NAAAHTTL3MBTL1 | |
| SCHEMBL18253417 | 0.85 | CYP2C19 (0.43) | EPHX1CYP19A1NAAAHTTL3MBTL1 | |
| SCHEMBL18253398 | 0.85 | CYP2C19 (0.50) | EPHX1CYP19A1NAAAHTTL3MBTL1 | |
| SCHEMBL18253338 | 0.85 | EPHX1 (0.39) | EPHX1CYP19A1NAAAHTTL3MBTL1 | |
| SCHEMBL27587439 | 0.85 | CYP19A1 (0.47) | EPHX1CYP19A1NAAAHTTL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | claimed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | claimed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | claimed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | claimed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | claimed |
| US-11820162-B2 | Pretreatment liquid, ink set, base material for image recording, method of producing base material for image recording, image recording material, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820162-B2 | Pretreatment liquid, ink set, base material for image recording, method of producing base material for image recording, image recording material, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230305403-A1 | PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230261252-A1 | INORGANIC SOLID ELECTROLYTE-CONTAINING COMPOSITION, SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR SHEET FOR ALL-SOLID STATE SECONDARY BATTERY AND ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| WO-2023140386-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023112746-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-06-22 | — | — | WO | disclosed |
| US-20230194988-A1 | TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | disclosed |
| US-20050244441-A1 | Cosmetic compositions | UNILEVER HOME & PERSONAL CARE USA, DIVISION OF CONOPCO, INC. | 2005-11-03 | — | — | US | disclosed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
| US-6667285-B1 | Branched-chain carboxylic acid monoalkyl ester with outstanding hydrolytic stability | NEW JAPAN CHEMICAL CO., LTD. (JP) | 2003-12-23 | — | — | US | disclosed |
| EP-1225213-A1 | LUBRICATING OIL FOR REFRIGERATOR, HYDRAULIC FLUID COMPOSITION FOR REFRIGERATOR AND METHOD FOR LUBRICATION OF REFRIGERATOR | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 2002-07-24 | — | — | EP | disclosed |