Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | PTPRZ1 | P23471 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7872376 | 0.62 | KDM4E (0.39) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 | |
| SCHEMBL10382746 | 0.60 | KDM4E (0.33) | KDM4EALDH1A1TDP1 | |
| SCHEMBL7603891 | 0.60 | KDM4E (0.43) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 | |
| SCHEMBL20411965 | 0.60 | KDM4E (0.42) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 | |
| SCHEMBL900510 | 0.59 | KDM4E (0.41) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 | |
| SCHEMBL16707569 | 0.59 | ALDH1A1 (0.46) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 | |
| SCHEMBL22028275 | 0.57 | AHR (0.50) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 | |
| SCHEMBL16707603 | 0.57 | SMN1; SMN2 (0.42) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 | |
| SCHEMBL777056 | 0.57 | ALDH1A1 (0.56) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 | |
| SCHEMBL16707484 | 0.56 | SMN1; SMN2 (0.41) | KDM4EALDH1A1TDP1PTPN1PTPRZ1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0830709-B1 | ELECTROLYTE MATERIALS CONTAINING HIGHLY DISSOCIATED METAL ION SALTS | MOLTECH CORP (US) | 2001-07-04 | — | — | EP | disclosed |
| EP-0830709-A4 | ELECTROLYTE MATERIALS CONTAINING HIGHLY DISSOCIATED METAL ION SALTS | MOLTECH CORP (US) | 1998-05-20 | — | — | EP | disclosed |
| EP-0830709-A1 | ELECTROLYTE MATERIALS CONTAINING HIGHLY DISSOCIATED METAL ION SALTS | Moltech Corporation (US) | 1998-03-25 | — | — | EP | disclosed |
| WO-1996029753-A9 | ELECTROLYTE MATERIALS CONTAINING HIGHLY DISSOCIATED METAL ION SALTS | — | 1997-01-16 | — | — | WO | disclosed |
| WO-1996029753-A1 | ELECTROLYTE MATERIALS CONTAINING HIGHLY DISSOCIATED METAL ION SALTS | MOLTECH CORPORATION (US) | 1996-09-26 | — | — | WO | disclosed |
| US-5538812-A | ELECTROLYTIC CELLS WITH POLYETHERSILOXANES WITH GROUPS OF TRIFLUOROMETHANESULFONYL | MOLTECH CORPORATION (US) | 1996-07-23 | — | — | US | disclosed |