Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.36 |
| ▸ | PDE4B | Q07343 | 2/20 | 0.35 |
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.33 |
| ▸ | DHFR | P00374 | 1/20 | 0.33 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | RBP4 | P02753 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7710565 | 0.91 | ALDH1A1 (0.40) | KDM4CPDE4BALDH1A1RBP4CYP2D6 | |
| SCHEMBL30788461 | 0.85 | KDM4C (0.41) | KDM4CPDE4BSLC6A3PTPN1DHFR | |
| SCHEMBL6342508 | 0.85 | KDM4C (0.41) | KDM4CPDE4BSLC6A3PTPN1DHFR | |
| SCHEMBL1603487 | 0.84 | CYP2D6 (0.41) | SLC6A3CYP2D6SLC6A2SLC6A4 | |
| SCHEMBL7240375 | 0.81 | PDE4B (0.46) | PDE4BSLC6A3PTPN1ALDH1A1SLC6A2 | |
| SCHEMBL7241320 | 0.81 | ALDH1A1 (0.44) | PDE4BSLC6A3ALDH1A1MEN1KMT2A | |
| SCHEMBL16861328 | 0.78 | SLC6A3 (0.36) | PDE4BSLC6A3PTPN1RBP4MEN1 | |
| SCHEMBL16861336 | 0.78 | SLC6A3 (0.36) | PDE4BSLC6A3PTPN1RBP4MEN1 | |
| SCHEMBL954903 | 0.78 | HPGD (0.38) | KDM4CPDE4BPTPN1DHFRALDH1A1 | |
| SCHEMBL8067831 | 0.78 | KDM4C (0.37) | KDM4CPDE4BSLC6A3PTPN1DHFR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6303264-B1 | PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-0675410-B1 | Resist composition for deep ultraviolet light | WAKO PURE CHEM IND LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| EP-0875787-A1 | Method for reducing the substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 1998-11-04 | — | — | EP | disclosed |
| US-5780206-A | USING AN ANTHRACENE DERIVATIVE AS AN ABSORBER ON HIGHLY REFLECTIVE SURFACES; ALKALI-SOLUBLE POLYMERS; GENERATION OF ACID CATALYSTS; FINE PATTERNS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1998-07-14 | — | — | US | disclosed |
| US-5695910-A | RESIN BECOMES ALKALI SOLUBLE BY ELIMINATING PROTECTIVE GROUPS BY ACTION OF IN SITU GENERATED ACID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
| EP-0675410-A1 | Resist composition for deep ultraviolet light | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-10-04 | — | — | EP | disclosed |