Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.36 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.36 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7573462 | 0.72 | ALDH1A1 (0.38) | TSHRALDH1A1 | |
| SCHEMBL225285 | 0.71 | LMNA (0.43) | LMNACHRM2CHRM4CHRM5CHRM1 | |
| SCHEMBL8747972 | 0.71 | — | — | |
| SCHEMBL8928296 | 0.70 | LMNA (0.42) | LMNACHRM2CHRM4CHRM5CHRM1 | |
| SCHEMBL10893130 | 0.70 | LMNA (0.47) | LMNACHRM2CHRM4CHRM5CHRM1 | |
| SCHEMBL29728540 | 0.70 | LMNA (0.42) | LMNACHRM2CHRM4CHRM5CHRM1 | |
| SCHEMBL29728550 | 0.70 | LMNA (0.48) | LMNACHRM2CHRM4CHRM5CHRM1 | |
| SCHEMBL4913990 | 0.70 | ALDH1A1 (0.52) | TSHRMAPTALDH1A1 | |
| SCHEMBL2918544 | 0.69 | — | — | |
| SCHEMBL28163483 | 0.68 | LMNA (0.45) | LMNACHRM2CHRM4CHRM5CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8568960-B2 | Multiple exposure photolithography methods | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-29 | — | — | US | claimed |
| US-8236476-B2 | Multiple exposure photolithography methods and photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-08-07 | — | — | US | claimed |
| US-20120178027-A1 | MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-12 | — | — | US | claimed |
| EP-2240828-A1 | MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSITIONS | International Business Machines Corporation (US) | 2010-10-20 | — | — | EP | claimed |
| WO-2009087029-A1 | MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | WO | claimed |
| US-20090176174-A1 | MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSTIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-09 | — | — | US | claimed |
| US-9235119-B2 | Exposure photolithography methods | GLOBALFOUNDRIES INC. (KY) | 2016-01-12 | — | — | US | disclosed |
| US-20140349237-A1 | EXPOSURE PHOTOLITHOGRAPHY METHODS | GLOBALFOUNDRIES U.S. INC. | 2014-11-27 | — | — | US | disclosed |
| US-8846296-B2 | Photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-30 | — | — | US | disclosed |
| US-8568960-B2 | Multiple exposure photolithography methods | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-29 | — | — | US | disclosed |
| US-8394573-B2 | Photoresist compositions and methods for shrinking a photoresist critical dimension | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-03-12 | — | — | US | disclosed |
| US-20120214099-A1 | PHOTORESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-08-23 | — | — | US | disclosed |
| US-8236476-B2 | Multiple exposure photolithography methods and photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-08-07 | — | — | US | disclosed |
| US-20120070787-A1 | PHOTORESIST COMPOSITIONS AND METHODS FOR SHRINKING A PHOTORESIST CRITICAL DIMENSION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-22 | — | — | US | disclosed |
| US-7838200-B2 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-23 | — | — | US | disclosed |
| EP-2240828-A1 | MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSITIONS | International Business Machines Corporation (US) | 2010-10-20 | — | — | EP | disclosed |
| WO-2009087029-A1 | MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | WO | disclosed |
| US-20090176174-A1 | MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSTIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-09 | — | — | US | disclosed |
| WO-2009074522-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | WO | disclosed |
| US-20090155715-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | US | disclosed |