Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 5/20 | 0.56 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.54 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | GFER | P55789 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | CASP7 | P55210 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13406869 | 0.83 | HTR6 (0.53) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL4464881 | 0.81 | HTR6 (0.55) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL565003 | 0.80 | HTR6 (0.69) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL17774551 | 0.79 | POLB (0.69) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL29712886 | 0.78 | HTR6 (0.66) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL1162839 | 0.78 | HTR6 (0.66) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL9070302 | 0.78 | HTR6 (0.66) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL29480329 | 0.78 | HTR6 (0.66) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL8066769 | 0.77 | HTR6 (0.58) | HTR6HKDC1GAAPOLBGFER | |
| SCHEMBL8723742 | 0.77 | POLB (0.67) | HTR6HKDC1GAAPOLBGFER |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6319656-B1 | FORMING FILM OF A NEGATIVE-WORKING PHOTO-SENSITIVE POLYIMIDE PRECURSOR ON A SUBSTRATE; EXPOSING FILM TO LIGHT THROUGH A MASK HAVING A PREDETERMINED PATTERN; DEVELOPING THE EXPOSED FILM USING AN ALKALINE AQUEOUS SOLUTION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-11-20 | — | — | US | disclosed |