SCHEMBL7876585

SCHEMBL7876585

COc1ccc(N(c2ccccc2)c2ccc(CCc3ccc(CCc4ccc(N(c5ccccc5)c5ccc(OC)cc5)cc4)cc3)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.55
AOC3 Q16853 2/20 0.50
KCNH2 Q12809 1/20 0.50
ABCB1 P08183 1/20 0.50
CALM1 P0DP23 1/20 0.50
TAAR1 Q96RJ0 1/20 0.50
MEN1 O00255 1/20 0.49
KMT2A Q03164 1/20 0.49
CNR1 P21554 1/20 0.48
CNR2 P34972 1/20 0.48
ALOX5 P09917 1/20 0.48
NR1H3 Q13133 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
NPC1 O15118 1/20 0.47
RAB9A P51151 1/20 0.47
TUBB4A P04350 1/20 0.47
TUBB P07437 1/20 0.47
TUBA3C P0DPH7 1/20 0.47
TUBA1B P68363 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8206442 1.00 LTA4H (0.55) LTA4HAOC3KCNH2ABCB1CALM1
SCHEMBL8943601 0.92 TAAR1 (0.57) AOC3CALM1TAAR1TUBB4ATUBB
SCHEMBL31119334 0.90 L3MBTL1 (0.50) LTA4HAOC3KCNH2CALM1MEN1
SCHEMBL13777812 0.89 LTA4H (0.55) LTA4HKCNH2MEN1KMT2ACNR1
SCHEMBL14174204 0.89 KCNH2 (0.58) LTA4HKCNH2MEN1KMT2ATDP1
SCHEMBL10065630 0.88 CA4 (0.59) LTA4HKMT2ACNR1CNR2TDP1
SCHEMBL3339294 0.88 CA4 (0.59) LTA4HKMT2ACNR1CNR2TDP1
SCHEMBL578164 0.88 CA4 (0.59) LTA4HKMT2ACNR1CNR2TDP1
SCHEMBL13720596 0.88 CA4 (0.59) LTA4HKMT2ACNR1CNR2TDP1
SCHEMBL13720711 0.88 CA4 (0.59) LTA4HKMT2ACNR1CNR2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316577-B1 PHOTOSENSITIVITY AND DURABILITY; HODOGAYA CHEMICAL CO., LTD. (JP) 2001-11-13 US disclosed
US-6027846-A HIGH PHOTOSENSITIVITY, HIGH DURABILITY RICOH COMPANY, LTD. (JP) 2000-02-22 US disclosed