⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Maleic Anhydride SCHEMBL6318484 | 0.86 | CYP2D6 (0.32) | — | |
| SCHEMBL7918316 | 0.80 | — | — | |
| SCHEMBL7696963 | 0.79 | CYP2D6 (0.33) | — | |
| Maleic Anhydride SCHEMBL5410505 | 0.76 | — | — | |
| SCHEMBL1206903 | 0.75 | CYP2D6 (0.36) | — | |
| Acetic Acid SCHEMBL8099722 | 0.73 | — | — | |
| SCHEMBL8106173 | 0.71 | PTGS1 (0.32) | — | |
| SCHEMBL9317520 | 0.71 | CYP2D6 (0.35) | — | |
| SCHEMBL710692 | 0.71 | CYP2D6 (0.35) | — | |
| SCHEMBL2364494 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6316162-B1 | PHOTORESISTS PATTERNS AND MALEIC ANHYDRIDE-NORBORNENE ESTER COPOLYMERS AND PHOTOACID GENERATORS, COATINGS AND EXPOSURE, SPRAYING SILYLATION AND DRY ETCHING | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-11-13 | — | — | US | disclosed |